Author Affiliations
1Department of Material Science and Engineer, Xiangtan University, Xiangtan 411105, China2Science and Technology on Reliability Physics and Application Technology of Electronic Component Laboratory, Fifth Institute of Electronics of the Ministry of Industry and Information Technology, Guangzhou 510610, Chinashow less
Fig. 1. Device physical models of HfO2-based FeFET.
Fig. 2. Read and write circuit of 2 × 2 ferroelectric memory array.
Fig. 3. Control simulation timing of 2 × 2 ferroelectric memory array.
Fig. 4. Charge density distribution inside the device when HfO2-based FeFET is written: (a) The internal charge distribution of the device is written with “1”; (b) the internal charge distribution of the device is written with “0”.
Fig. 5. Reading and writing of ferroelectric memory arrays: (a) Changes in the output signal of the sense amplifier; (b) changes in the output signal of cell 1; (c) changes in the polarization of cell 1.
Fig. 6. Transient effects of single-particle incident read and write “0” ferroelectric storage tube drain: (a) Change of drain current pulse; (b) change of cell 1 output signal; (c) change of cell 1 polarization intensity; (d) change of sense amplifier output signal.
Fig. 7. Transient effects of single-particle incident read and write “1” ferroelectric storage tube drain: (a) Change of cell 1 polarization intensity; (b) change of cell 1 output signal; (c) change of sense amplifier output signal.
Fig. 8. Transient effects of a single-particle incident sensible amplifier input tube when reading and writing “0”: (a) Change of ferroelectric cell 1 polarization intensity; (b) change of sense amplifier output signal.
Fig. 9. Transient effects of a single-particle incident sensible amplifier input tube when reading and writing “1”: (a) Change of ferroelectric transistor polarization intensity; (b) change of sense amplifier output signal.
Fig. 10. Signal change of ferroelectric memory cell cell 1 under single-particle HZO ferroelectric thin film with different remanent polarization and coercive field: (a) Change of ferroelectric transistor polarization intensity; (b) change of sense amplifier output signal.
Fig. 11. Transient effects of two single-particle incident read and write “1” ferroelectric storage tube drain: (a) Change of drain current pulse; (b) change of cell 1 polarization intensity; (c) change of sense amplifier output signal.
Fig. 12. Transient effects of two single-particle incident read and write “0” ferroelectric storage tube drain: (a) Change of cell 1 polarization intensity; (b) change of sense amplifier output signal.
参数 | 数值 | 多晶硅厚度/nm | 20 | 栅氧层厚度/nm | 1 | 铁电层厚度/nm | 10 | 沟道长度/nm | 45 | N型衬底浓度/cm–3 | 1 × 1016 | N阱浓度/cm–3 | 5 × 1016 | 源/漏浓度/cm–3 | 2 × 1020 | 阈值电压掺杂浓度/cm–3 | 5 × 1017 | 饱和极化值Ps/μC·cm–2 | 28 | 剩余极化值Pr/μC·cm–2 | 23 | 矫顽场强度Ec/MV·cm–1 | 1 | 介电常数Eps | 22 |
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Table 1. Process parameters of HfO2-FeFET.
| LET值/MeV·cm2·mg–1 | 0 | 10 | 20 | 30 | 120 | 150 | 180 | 电压差/V | 1.9 | 1.85 | 1.7 | 1.2 | 1 | 0.95 | 0.9 |
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Table 2. Voltage difference change between Out 1 and Out 2.
输出端Out 1和Out 2之间的电位差变化