Refractive Indexes of Oxidized Thin Films Deposited by Ion Beam Sputtering

[in Chinese]; [in Chinese]; [in Chinese]; [in Chinese]; [in Chinese]

Journals >Acta Optica Sinica >Volume 22 >Issue 3 >Page 290 > Article

Acta Optica Sinica
Vol. 22, Issue 3, 290 (2002)

Refractive Indexes of Oxidized Thin Films Deposited by Ion Beam Sputtering

[in Chinese]^*, [in Chinese], [in Chinese], [in Chinese], and [in Chinese]

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[in Chinese]

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[in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese]. Refractive Indexes of Oxidized Thin Films Deposited by Ion Beam Sputtering[J]. Acta Optica Sinica, 2002, 22(3): 290 Copy Citation Text

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References

[1] Zoller R, Gotzelmann R, Matl K et al.. Temperature-stable bandpass filters deposited with plasma ion-assisted deposition. Appl. Opt., 1996, 35(28):5609～5612

[2] Takashashi H. Temperature stability of thin-film narrow-bandpass filters produced by ion-assisted deposition. Appl. Opt., 1995, 34(4):667～675

[3] Qi T, Daibu S, Kazuo K et al.. Fabrication and characteristics of DWDM filters deposited by IAD. Opt. Instrum., 1999, 21(4～5):74～80

CLP Journals

[1] Xue Hui, Shen Weidong, Gu Peifu, Luo Zhenyue, Liu Xu, Zhang Yueguang. Thickness Measurement of Thin Film Based on White-Light Spectral Interferometry[J]. Acta Optica Sinica, 2009, 29(7): 1877

[in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese]. Refractive Indexes of Oxidized Thin Films Deposited by Ion Beam Sputtering[J]. Acta Optica Sinica, 2002, 22(3): 290

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