TiN films were prepared with different process parameters by magnetron sputtering apparatus. The optical properties and optical constants were investigated in detail. The depth compositional profile and surface morphology were studied by Auger electron spectroscope and atomic force microscope. The results indicated that the optical properties strongly depend on chemical proportion of titanium and nitride in TiN film. It is confirmed that the stoichiometric TiN films have good spectral solar selectivity. Furthermore, sputtering process using the substrate applied with negative bias voltage can improve the properties of TiN films.