• Chinese Optics Letters
  • Vol. 15, Issue 4, 043401 (2017)
Shenghao Chen, Xin Wang, Qiushi Huang, Shuang Ma, and Zhanshan Wang*
Author Affiliations
  • Key Laboratory of Advanced Micro-Structured Materials MOE, Institute of Precision Optical Engineering, School of Physics Science and Engineering, Tongji University, Shanghai 200092, China
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    DOI: 10.3788/COL201715.043401 Cite this Article Set citation alerts
    Shenghao Chen, Xin Wang, Qiushi Huang, Shuang Ma, Zhanshan Wang. 13.5  nm Schwarzschild microscope with high magnification and high resolution[J]. Chinese Optics Letters, 2017, 15(4): 043401 Copy Citation Text show less

    Abstract

    A Schwarzschild microscope with a numerical aperture of 0.2 and a magnification of 130 in a 100 μm field of view (FOV) is designed and is working at 13.5 nm. Meanwhile, a CCD is used as a detector with a pixel size of 13 μm×13 μm and imaging area of 13 mm×13 mm. The imaging quality with tolerances of system and errors of mirrors are considered. We obtain that the best on-axes object resolution can be up to about 200 nm, the average value is 230 nm, and the resolution is about 360 nm at 80 μm FOV.
    R1=2M+M2,(1)

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    R2=2aM2+1,(2)

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    M2=(1+M)(5+6M+5M2)1/22,(3)

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    a=(M2M22)(MM2)(1M22)(1M2),(4)

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    M=13μm/100nm=130.(5)

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    f=1/δ/M39lp/mm.(6)

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    NA=H1/2L1.(7)

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    FOV=13mm/M=100μm.(8)

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    δsystem=1/fsystem/M100nm.(9)

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    δ=δsystem+[(δfigureδsystem)2+(δeccentricityδsystem)2+(δpositionδsystem)]1/2=124nm.(10)

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    Shenghao Chen, Xin Wang, Qiushi Huang, Shuang Ma, Zhanshan Wang. 13.5  nm Schwarzschild microscope with high magnification and high resolution[J]. Chinese Optics Letters, 2017, 15(4): 043401
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