• Acta Physica Sinica
  • Vol. 68, Issue 10, 108501-1 (2019)
Qun-Gang Ma1、2, Liu-Fei Zhou3, Yue Yu3, Guo-Yong Ma3, and Sheng-Dong Zhang1、2、*
Author Affiliations
  • 1School of Electronic and Computer Engineering, Peking University, Shenzhen 518055, China
  • 2School of Electronics Engineering and Computer Science, Peking University, Beijing 100871, China
  • 3Nanjing CEC Panda FPD Technology Co., Ltd., Nanjing 210033, China
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    DOI: 10.7498/aps.68.20190265 Cite this Article
    Qun-Gang Ma, Liu-Fei Zhou, Yue Yu, Guo-Yong Ma, Sheng-Dong Zhang. Electro-static discharge failure analysis and design optimization of gate-driver on array circuit in InGaZnO thin film transistor backplane[J]. Acta Physica Sinica, 2019, 68(10): 108501-1 Copy Citation Text show less
    Diagram of the GOA circuit unit composed of 13 TFTs and 1 capacitor.13T1C架构的GOA电路单元原理图
    Fig. 1. Diagram of the GOA circuit unit composed of 13 TFTs and 1 capacitor.13T1C架构的GOA电路单元原理图
    ESD damage phenomenon of GOA circuit: (a) Photo image of the overall GOA where ESD damage occurs. (b) photo image of ESD damage M2 TFT in the GOA unit.GOA电路的ESD破坏现象 (a) GOA区大面积的ESD烧伤现象; (b) M2 TFT的ESD破坏现象
    Fig. 2. ESD damage phenomenon of GOA circuit: (a) Photo image of the overall GOA where ESD damage occurs. (b) photo image of ESD damage M2 TFT in the GOA unit.GOA电路的ESD破坏现象 (a) GOA区大面积的ESD烧伤现象; (b) M2 TFT的ESD破坏现象
    Analysis of ESD failure area of M2 TFT: (a) FIB section analysis of ESD failure position; (b) elemental analysis of gate insulator at failure position of ESD.M2 TFT的ESD失效区域解析 (a) ESD失效位置的FIB断面解析; (b) ESD失效位置的栅极绝缘层元素分析
    Fig. 3. Analysis of ESD failure area of M2 TFT: (a) FIB section analysis of ESD failure position; (b) elemental analysis of gate insulator at failure position of ESD.M2 TFT的ESD失效区域解析 (a) ESD失效位置的FIB断面解析; (b) ESD失效位置的栅极绝缘层元素分析
    M2 TFT characteristics at different positions from ESD failure center.距离ESD失效中心不同位置的M2 TFT特性
    Fig. 4. M2 TFT characteristics at different positions from ESD failure center.距离ESD失效中心不同位置的M2 TFT特性
    Mechanism of space charge effect formed by Cu2+ ion entering SiO2.Cu扩散引起的空间电荷效应与ESD失效机理
    Fig. 5. Mechanism of space charge effect formed by Cu2+ ion entering SiO2. Cu扩散引起的空间电荷效应与ESD失效机理
    Thickness contour distribution of Cu: SiNx/SiO2 three films.Cu:SiNx/SiO2三层薄膜的厚度等值线分布
    Fig. 6. Thickness contour distribution of Cu: SiNx/SiO2 three films. Cu:SiNx/SiO2三层薄膜的厚度等值线分布
    结构2个子TFT6个子TFT8个子TFT
    版图
    版图空间274.5 μm × 259.2 μm274.5 μm × 300.2 μm274.5 μm × 351.2 μm
    扫描线面积53158.859647.365519.6
    数据线面积43155.846190.249248.2
    扫描线密度74.71%72.4%68%
    数据线密度60.7%56.1%51.1%
    Table 1. Comparison of different design schemes of M2 TFT in GOA.
    Qun-Gang Ma, Liu-Fei Zhou, Yue Yu, Guo-Yong Ma, Sheng-Dong Zhang. Electro-static discharge failure analysis and design optimization of gate-driver on array circuit in InGaZnO thin film transistor backplane[J]. Acta Physica Sinica, 2019, 68(10): 108501-1
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