[1] Ni Wei, Wu Xingkun. Soft-lithography-based inter-chip optical interconnection circuit[J]. Acta Optica Sinica, 2007, 27(5): 813～818

[2] He Fei, Cheng Ya. Femtosecond laser micromachining: frontier in laser precision micromachining[J]. Chin. J. Lasers, 2007, 34(5): 595～622

[3] Liu Jiajun, Wang Zemin, Li Aikui et al.. Thresholds of laser power density in fabricating strip optical waveguides by laser direct writing method[J]. Chin. J. Lasers, 2007, 34(6): 765～770

[4] Li Yang, Chingyue Wang, Xiaochang Ni et al.. Aluminum film microdeposition at 775 nm by femtosecond laser-induced forward transfer[J]. Chin. Opt. Lett., 2007, 5(5): 308～310

[5] Chen Linsen, Shao Jie, Wang Xuehui et al.. A new laser direct writing method of binary beams-shaping element[J]. Acta Photonica Sinica, 2005, 34(3): 346～348

[6] S. J. Henley, S. R. P. Silva. Laser direct write of silver nanoparticles from solution onto glass substrates for surface-enhanced Raman spectroscopy[J]. Appl. Phys. Lett., 2007, 91(2): 023107

[7] Kock Khuen Seet, Vygandas Jarutis, Saulius Juodkazis et al. Nanofabrication by direct laser writing and holography[C]. Proc. SPIE, 2005, 6050: 60500S

[8] Liang Fengchao, Hu Jun, Xu Zhijun. Realization of electric control of laser direct writing mesh on concave spherical substrate[J]. Optics and Precision Engineering, 2006, 14(5): 792～796

[9] Cynthia L. Vernold, Thomas D. Milster. Non-photolithographic fabrication of large computer-generated diffractive optical elements[C]. Proc. SPIE, 1994, 2263: 125～133

[10] David K. Poon, Glenn H. Chapman, Chinheng Choo et al.. Expanding grayscale capability of direct-write grayscale photomask by using modified Bi/In compositions[C]. Proc. SPIE, 2005, 5992:59920K11 Y. Cheng, T. Huang, C.-C. Chieng et al.. Thick-film lithography using laser write[J]. Microsystem Technologies, 2002, 9: 17～22

[11] Yuen-Chuen Chan, Yee-Loy Lam, Yan Zhou et al.. Development and applications of a laser writing lithography system for maskless patterning[J]. Opt. Engng., 1998, 37(9): 2521～2530

[12] Li Fengyou, Lu Zhenwu, Xie Yongjun et al.. Photolithographic fabrication techniques by using defocusing laser direct wiring[J]. Chin. J. Lasers, 2002, A29(9): 850～854

[13] Liang Yiyong, Yang Guoguang, Sun Rong. Research on focusing system characteristics and defocusing application in laser direct wiriter[J]. J. Zhejiang University (Engineering Science), 2005, 39(2): 269～272

[14] Onda Hajime. Line width control on laser beam writing (second report): Line width control by defocusing[J]. J. Japan Society of Precision Engineering, 1999, 65(8): 1158～1162

[15] Liang Yiyong. Dynamic Gaussian model of linewidth in defocus writing[J]. Acta Optica Sinica, 2006, 26(5): 726～729

[16] Liang Yiyong, Gu Zhiqi, Zhang Zheming et al.. Overexposure control for stabilizing linewidth[J]. J. Zhejiang University, 2006, 40(1): 49～52