• Chinese Journal of Lasers
  • Vol. 46, Issue 3, 0301001 (2019)
Jing Liang1、2、*, Huimin Jia1、*, Haitong Feng2, Jilong Tang1, Dan Fang1, Ruigong Su2, Baoshun Zhang2, and Zhipeng Wei1
Author Affiliations
  • 1 State Key Laboratory of High Power Semiconductor Laser, Changchun University of Science and Technology, Changchun, Jilin 130022, China
  • 2 Suzhou Institute of Nano-Tech and Nano-Bionics, Chinese Academy of Sciences, Suzhou, Jiangsu 215123, China
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    DOI: 10.3788/CJL201946.0301001 Cite this Article Set citation alerts
    Jing Liang, Huimin Jia, Haitong Feng, Jilong Tang, Dan Fang, Ruigong Su, Baoshun Zhang, Zhipeng Wei. Influence of Oxide Aperture Structure on Lasing Performance for Vertical Cavity Surface Emitting Laser[J]. Chinese Journal of Lasers, 2019, 46(3): 0301001 Copy Citation Text show less

    Abstract

    In order to realize 894.6 nm single mode laser output with low threshold, high stability, we design vertical cavity surface emitting laser (VCSEL) devices with different mesa etching structure and study the influences of mesa diameter, oxide aperture shape and size on lasing performance. The research results show that the larger of the mesa in VCSEL device, the higher the threshold current; the more circular the oxide aperture, the higher the single mode suppression ratio. VCSEL devices with diameter of 4.4 μm circular oxide aperture is achieved, and the device can realize 894.6 nm single mode laser output with driving current of 0.6 mA and working temperature of 70-90 ℃, and the side mode suppression ratio is higher than 35 dB.
    Jing Liang, Huimin Jia, Haitong Feng, Jilong Tang, Dan Fang, Ruigong Su, Baoshun Zhang, Zhipeng Wei. Influence of Oxide Aperture Structure on Lasing Performance for Vertical Cavity Surface Emitting Laser[J]. Chinese Journal of Lasers, 2019, 46(3): 0301001
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