Analysis on High Numerical Aperture Polarized Imaging

LIU Yong; XING Ting-wen; YANG Xiong

doi:10.3969/j.issn.1003-501x.2011.12.007

Journals >Opto-Electronic Engineering >Volume 38 >Issue 12 >Page 35 > Article

Opto-Electronic Engineering
Vol. 38, Issue 12, 35 (2011)

Analysis on High Numerical Aperture Polarized Imaging

LIU Yong^1、2、*, XING Ting-wen¹, and YANG Xiong¹

Author Affiliations

¹[in Chinese]

²[in Chinese]

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DOI: 10.3969/j.issn.1003-501x.2011.12.007 Cite this Article

LIU Yong, XING Ting-wen, YANG Xiong. Analysis on High Numerical Aperture Polarized Imaging[J]. Opto-Electronic Engineering, 2011, 38(12): 35 Copy Citation Text

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References

[1] Harry J Levinson. Principles of Lithography [M]. Washington, SPIE Press, 2010.

[3] Smith Bruce W, Cashmore Julian. Challenges in high NA, polarization, and photoresists [J]. Proc. of SPIE(S0277-786X), 2002, 4691: 11-24.

[4] Smith Bruce W, Zavyalova L, Estroff A. Benefiting from polarization – effects on high-NA imaging [J]. Proc. of SPIE(S0277-786X), 2004, 5377: 68-79.

[5] Smith Bruce W, Zhou Jian-ming, Xie Peng. Applications of TM polarized illumination [J]. Proc. of SPIE(S0277-786X), 2008, 6924: 0J1-12.

[6] Sang-Kon Kim. Analytical Approach to High-NA Images [J]. Proc. of SPIE(S0277-786X), 2007, 6520: 3D1-16.

[8] Mansuripur M. Certain computational aspects of vector diffraction problems [J]. J Opt Soc Am A(S1084-7529), 1989, 6: 786 -805.

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LIU Yong, XING Ting-wen, YANG Xiong. Analysis on High Numerical Aperture Polarized Imaging[J]. Opto-Electronic Engineering, 2011, 38(12): 35

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