A Study on Polarized Light Imaging in Super-Microlithography

[in Chinese]; [in Chinese]; [in Chinese]; [in Chinese]

[1] RIZVI S A.National Technology Roadmap for Semiconductors:An Analysis and Perspective [J].SPIE,1998,3331:190-196.

[2] LEVENSON M D.Wavefront Engineering from 50nm to 100nm CD [J].SPIE,1997,3051:2-13.

[3] FINDERS J,JORRITSMA L,EURLINGS M,et al.Can DUV Take Us Below 100nm[J].SPIE,2001,4346:153-165.

[4] WAGNER C,KAISER W,MULKENS,et al.Advanced Technology for Extending Optical Lithography [J].SPIE,2000,4000:344-357.

[5] FLAGELLO D G,MULKENS J,WAGNER C.Optical Lithography into the Millennium:Sensitivity to Aberrations,Vibration and Polarization [J].SPIE,2000,4000:172-183.

[6] YEUNG M.Modeling High Numerical Aperture Optical Lithography [J].SPIE,1988,922:149-167.

[7] FLAGELLO D G,ROSENBLUTH A E,PROGLER C,et al.Understanding High Numerical Aperture Optical Lithography [J].Microelectronic Engineering,1992,17:105-108.

CLP Journals