• Acta Optica Sinica
  • Vol. 39, Issue 12, 1214003 (2019)
Xiao Zhang, Kai Liu, Mingdi Wang*, Yüji Ni, Yü Pan, Jincong Liu, Chao Ni, and Wenjie Zhang
Author Affiliations
  • School of Mechanical and Electric Engineering, Soochow University, Suzhou, Jiangsu 215021, China
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    DOI: 10.3788/AOS201939.1214003 Cite this Article Set citation alerts
    Xiao Zhang, Kai Liu, Mingdi Wang, Yüji Ni, Yü Pan, Jincong Liu, Chao Ni, Wenjie Zhang. Etching Technology for Copper-Clad Laminates Based on Femtosecond Laser[J]. Acta Optica Sinica, 2019, 39(12): 1214003 Copy Citation Text show less
    Ultra depth of field measurement results of FPC copper-clad laminate
    Fig. 1. Ultra depth of field measurement results of FPC copper-clad laminate
    Experimental scheme
    Fig. 2. Experimental scheme
    FPC copper etching model and scanning path
    Fig. 3. FPC copper etching model and scanning path
    Relationship among femtosecond laser power, depth, and roughness at the etched area of copper layer
    Fig. 4. Relationship among femtosecond laser power, depth, and roughness at the etched area of copper layer
    Relationship among femtosecond laser frequency, depth, and roughness in the etched area of copper layer
    Fig. 5. Relationship among femtosecond laser frequency, depth, and roughness in the etched area of copper layer
    Relationship among scanning speed of femtosecond laser, depth, and roughness in the etched area of copper layer
    Fig. 6. Relationship among scanning speed of femtosecond laser, depth, and roughness in the etched area of copper layer
    Relationship among femtosecond laser scanning times, depth, and roughness in the etched area of the copper layer
    Fig. 7. Relationship among femtosecond laser scanning times, depth, and roughness in the etched area of the copper layer
    Relationship among femtosecond laser defocusing amount, depth, and roughness in the etched area of copper layer
    Fig. 8. Relationship among femtosecond laser defocusing amount, depth, and roughness in the etched area of copper layer
    Measurement results of 3D laser microscope. (a) Etching window; (b) 3D morphology
    Fig. 9. Measurement results of 3D laser microscope. (a) Etching window; (b) 3D morphology
    EDS measurement results of etched area. (a) Micro morphology of etched area; (b) EDS spectrum
    Fig. 10. EDS measurement results of etched area. (a) Micro morphology of etched area; (b) EDS spectrum
    Serial numberPower /mWScanning speed /(mm·s-1)Frequency /kHzScanning timesDefocusing amount /mmEtching depth /μmRoughness /μm
    17030303020.041.39
    217030303023.621.54
    327030303031.941.77
    437030303067.572.23
    5470303030ThroughThrough
    637030203055.431.45
    737030403033.022.15
    837030503028.802.01
    937030603023.321.89
    1037040303032.732.01
    1137050303028.321.85
    1237060303026.821.72
    1337070303024.171.65
    1437030301023.081.84
    1537030302030.662.04
    16370303040ThroughThrough
    17370303050ThroughThrough
    18370303030.342.872.03
    19370303030.1548.152.14
    2037030303-0.1569.772.97
    2137030303-0.3ThroughThrough
    Table 1. Process parameters and experimental results of FPC copper laminate etched by femtosecond laser
    LevelAverage power /mWScanning speed /(mm·s-1)Scanning timesDefocusing amount /mmRepetition frequency /kHz
    12803610.1235.0
    22943720.1836.5
    33083830.2438.0
    43223940.3039.5
    Table 2. Factor level table
    Serial numberLevelDepth /μmRoughness /μm
    ABCDE
    11111121.151.28
    21222230.101.57
    31333331.401.60
    41444473.081.19
    52123430.461.56
    62214315.771.51
    72341269.231.37
    82432129.621.67
    931342ThroughThrough
    1032431ThroughThrough
    113312414.871.50
    123421325.971.85
    1341423ThroughThrough
    144231439.222.48
    154324132.461.67
    164413216.011.34
    Table 3. Element arrangement and results of orthogonal test
    ItemLevel averagePower /mWScanning speed /(mm·s-1)Scanning timesDefocusing amount /mmFrequency /kHz
    Depthk138.9350.7016.9538.8939.71
    k236.2740.1729.7537.5547.73
    k348.0136.9945.9638.3737.18
    k440.8236.1773.3749.2339.41
    Range11.7414.5356.4211.6810.55
    Roughnessk11.411.421.411.751.54
    k21.531.851.661.581.43
    k31.681.541.921.501.65
    k41.831.511.281.461.68
    Range0.420.430.640.290.25
    Table 4. Range analysis
    AreaAtomic number fraction /%
    COCu
    Original FPC board layer0.21.198.7
    Etched bottom area74.324.90.2
    Table 5. Atomic number fraction of each element
    Xiao Zhang, Kai Liu, Mingdi Wang, Yüji Ni, Yü Pan, Jincong Liu, Chao Ni, Wenjie Zhang. Etching Technology for Copper-Clad Laminates Based on Femtosecond Laser[J]. Acta Optica Sinica, 2019, 39(12): 1214003
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