[1] F. Wang, X. Z. Wang, M. Y. Ma, D. Q. Zhang, and W. J. Shi, Laser & Optoelectronics Progress (in Chinese) 41, (6) 33 (2004).
[2] D. Q. Zhang, X. Z. Wang, W. J. Shi, and F. Wang, Acta Opt. Sin. (in Chinese) (to be published).
[3] D. Zhang, X. Wang, and W. Shi, Chin. Opt. Lett. 3, 589 (2005).
[4] J. P. Kirk and C. J. Progler, Proc. SPIE 3334, 281 (1998).
[5] K. Sato, S. Tanaka, T. Fujisawa, and S. Inoue, Proc. SPIE 3679, 99 (1999).
[6] S. P. Renwick, S. D. Slonaker, I. Lalovic, and K. Ahmed, Proc. SPIE 4691, 1400 (2002).
[7] G. Zhang, C. Wang, C. Tan, J. Ilzhoefer, C. Atkinson, S. P. Renwick, S. Slonaker, D. Godfrey, and C. Fruga, Proc. SPIE
[8] D. G. Flagello, R. Socha, X. Shi, J. van Schoot, J. Baselmans, M. van Kerkhof, W. de Boeij, A. Engelen, R. Carpaij, O. Noordman, M. Moers, M. Mulder, J. Fiders, H. van Greevenbroek, M. Schriever, M. Maul, H. Haidner, M. Goeppert, U. Wegmann, and P. Graeupner, Proc. SPIE 5040, 139 (2003).
[9] C. J. Progler, H. Du, and G. Wells, Proc. SPIE 3051, 660 (1997).
[10] J.-H. Kim, S.-H. Oh, D.-S. Lee, J.-H. Yeo, Y.-H. Yu, and J.-L. Nam, Proc. SPIE 3051, 54 (1997).
[11] H. J. Levinson, Principles of Lithography (SPIE Press, Washington, 2001).