Analysis of illumination pupil filling ellipticity for critical dimensions control in photolithography

Liping Guo; Xiangzhao Wang; Huijie Huang

Journals >Chinese Optics Letters >Volume 4 >Issue 4 >Page 04237 > Article

Chinese Optics Letters
Vol. 4, Issue 4, 04237 (2006)

Analysis of illumination pupil filling ellipticity for critical dimensions control in photolithography

Liping Guo^1、2、*, Xiangzhao Wang¹, and Huijie Huang¹

Author Affiliations

¹Information Optics Laboratory, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800

²Graduate School of the Chinese Academy of Sciences, Beijing 100039

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Liping Guo, Xiangzhao Wang, Huijie Huang. Analysis of illumination pupil filling ellipticity for critical dimensions control in photolithography[J]. Chinese Optics Letters, 2006, 4(4): 04237 Copy Citation Text

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Liping Guo, Xiangzhao Wang, Huijie Huang. Analysis of illumination pupil filling ellipticity for critical dimensions control in photolithography[J]. Chinese Optics Letters, 2006, 4(4): 04237

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