• Acta Optica Sinica
  • Vol. 30, Issue 3, 907 (2010)
Zhou Hongjun1、*, Zhong Pengfei2, Huo Tonglin1, Jiang Xinting1, and Zheng Jinjin2
Author Affiliations
  • 1[in Chinese]
  • 2[in Chinese]
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    DOI: 10.3788/aos20103003.0907 Cite this Article Set citation alerts
    Zhou Hongjun, Zhong Pengfei, Huo Tonglin, Jiang Xinting, Zheng Jinjin. Cleaning of Carbon Contamination on Si Wafer with Activated Oxygen by Synchrotron Radiation[J]. Acta Optica Sinica, 2010, 30(3): 907 Copy Citation Text show less
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    [12] T. Koid,T. Shidara,M. Yanagihara et al.. Resuscitation of carbon-contaminated mirrors and gratings by oxygen-discharge cleaning.2:efficiency recovery in teh 100-1000-eV range[J]. Appl. Opt.,1988,27(20):4305-4313

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    [15] Zhou Hongjun,Zhong Pengfei,Huo Tonglin et al.. Suppresion of higher-order harmonics by different material filters in 13-43 nm[J]. Optics and Precision Engineering,2007,15(12):1916-1920

    [16] Zhou Hongjun,Zhong Pengfei,Zheng Jinjin et al.. Quantitative research on higher order harmonics suppression in 17-33 nm with different thickness Al filters[J]. Optics and Precision Engineering,2007,15(7):1016-1020

    [17] Zhou Hongjun,Zheng Jinjin,Huo Tonglin et al.. Quantitative research on higher order harmonics in metrology beamline[J]. Optics and Precision Engineering,2007,15(5):640-645

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    Zhou Hongjun, Zhong Pengfei, Huo Tonglin, Jiang Xinting, Zheng Jinjin. Cleaning of Carbon Contamination on Si Wafer with Activated Oxygen by Synchrotron Radiation[J]. Acta Optica Sinica, 2010, 30(3): 907
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