Research on industrialization of nanofabrication and nanometrology

[in Chinese]; [in Chinese]

Journals >Opto-Electronic Engineering >Volume 33 >Issue 12 >Page 15 > Article

Opto-Electronic Engineering
Vol. 33, Issue 12, 15 (2006)

Research on industrialization of nanofabrication and nanometrology

[in Chinese]^1、2 and [in Chinese]¹

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¹[in Chinese]

²[in Chinese]

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[in Chinese], [in Chinese]. Research on industrialization of nanofabrication and nanometrology[J]. Opto-Electronic Engineering, 2006, 33(12): 15 Copy Citation Text

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References

[3] S.Matsui,T.Kaito,M.Komuro,et al.Three-dimensional nanostructure fabrication by focused-ion-beam CVD[J].J.Vac.Sci.Technol,2000,B18:3181-3184.

[4] Hans LOESCHNER,Gerhard STENGL,Herbert BUSCHBECK.Large-field particle beam optics for projection and proximity printing and for Mask-Less Lithography (ML2)[J].SPIE's Journal of Microlithography,Microfabrication and Microsystems,2003,2:34-48.

[5] Toshiaki FUJII,Haruo TAKAHASHI.Triple beam for TEM sample preparation[A].9th European FIB Users Group Meeting[C].Arcachon,France:EFUG,2005.3-4.

[6] Zhaohui CHEN.Development of ion and electron dual FIB apparatus for high spatial resolution three-dimensional microanalysis of solid materials[J].J.Vac.Sci.Technol,1998,B16(4):2473-2478.

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[in Chinese], [in Chinese]. Research on industrialization of nanofabrication and nanometrology[J]. Opto-Electronic Engineering, 2006, 33(12): 15

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