• Opto-Electronic Engineering
  • Vol. 50, Issue 12, 230281-1 (2024)
Jianwen Gong1、2、3, Jian Wang1、3, Junbo Liu1、3, Haifeng Sun1、3, and Song Hu1、3、*
Author Affiliations
  • 1Institute of Optics and Electronics, Chinese Academy of Science, Chengdu, Sichuan 610209, China
  • 2School of Optoelectronic Science and Engineering, University of Electronic Science and Technology of China, Chengdu, Sichuan 611731, China
  • 3University of Chinese Academy of Sciences, Beijing 100049, China
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    DOI: 10.12086/oee.2023.230281 Cite this Article
    Jianwen Gong, Jian Wang, Junbo Liu, Haifeng Sun, Song Hu. Microlens array machining method based on projection lithography[J]. Opto-Electronic Engineering, 2024, 50(12): 230281-1 Copy Citation Text show less

    Abstract

    A method for preparing microlens arrays based on projection lithography was proposed, and microlens arrays of various calibers and different surface roughness were successfully prepared by the method. The method employs a 0.2× projection objective lens to reduce the manufacturing cost of masks and realize the preparation of microlens arrays with different calibers. We achieve superior surface figure accuracy while reducing the complexity of mask preparation by employing a projection-based mask-shift filtering technique. Four kinds of microlens arrays with different calibers, 50 μm, 100 μm, 300 μm and 500 μm, were prepared. The machining accuracy of the surface morphology reaches the sub-micron level and the surface roughness reaches the nanometer level. The experimental results show that this method has great potential in the fabrication of microlens arrays, and can achieve lower line width and higher surface profile accuracy than traditional methods.
    Jianwen Gong, Jian Wang, Junbo Liu, Haifeng Sun, Song Hu. Microlens array machining method based on projection lithography[J]. Opto-Electronic Engineering, 2024, 50(12): 230281-1
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