• Laser & Optoelectronics Progress
  • Vol. 55, Issue 10, 103102 (2018)
Zhuang Qiuhui1、* and Wang Sanqiang2
Author Affiliations
  • 1[in Chinese]
  • 2[in Chinese]
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    DOI: 10.3788/lop55.103102 Cite this Article Set citation alerts
    Zhuang Qiuhui, Wang Sanqiang. Monitoring Method of Optical Film Thickness[J]. Laser & Optoelectronics Progress, 2018, 55(10): 103102 Copy Citation Text show less
    References

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    [2] Mi Q, Zhao L. New algorithm for monitoring optical thin-film thickness[J]. Journal of Applied Optics, 2014, 35(2): 248-253.

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    [4] Han J. Research on key technologies of optical film thickness broadband monitoring[D]. Xi′an: Xi′an Electronic and Science University, 2011.

    [5] Yoshioka Y, Ikuta T, Taji T, et al. Monitoring of Si molecular-beam epitaxial growth by an ellipsometric method[J]. Japanese Journal of Applied Physics, 2001, 40(1): 371-375.

    [6] Wu P Y, Gu P F, Tang J F. Wideband monitoring of optical coatings with deposition error correction[J]. Proceedings of SPIE, 1993, 2000: 121-132.

    [7] Zhu M P, Yi K, Guo S H, et al. Research of an automatic system monitoring thickness of optical thin-film[J]. Acta Photonica Sinica, 2007, 36(2): 308-311.

    [8] Lin Y X. Optical thin film thickness real-time monitoring system and its inversion research[D]. Hangzhou: Zhejiang University, 2004.

    [9] Yang M H, Liu J S, Chen Q M, et al. Research on monitoring methods for optical thin film deposition[J]. Laser & Optoelectronics Progress, 2001, 38(s1): 500-502.

    Zhuang Qiuhui, Wang Sanqiang. Monitoring Method of Optical Film Thickness[J]. Laser & Optoelectronics Progress, 2018, 55(10): 103102
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