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    Journals >Opto-Electronic Engineering >Volume 40 >Issue 2 >Page 87 > Article
    • Opto-Electronic Engineering
    • Vol. 40, Issue 2, 87 (2013)
    Impact of Non-ideal Illumination Pupil on Imaging Performance of Lithography
    CHEN An1、2、*, LIN Wumei1, and JIANG Haibo1、2
    Author Affiliations
  • 1[in Chinese]
  • 2[in Chinese]
    • show less
    DOI: 10.3969/j.issn.1003-501x.2013.02.014 Cite this Article
    CHEN An, LIN Wumei, JIANG Haibo. Impact of Non-ideal Illumination Pupil on Imaging Performance of Lithography[J]. Opto-Electronic Engineering, 2013, 40(2): 87 Copy Citation Text show less
    References

    [4] Mark C Phillips, Steve D Slonaker, Chris Treadwaya, et al. Influence of illumination tilt on imaging [J]. Proceedings of SPIE(S0277-786X), 2005, 5754: 1562-1573.

    [8] Steve Slonaker, Bryan Riffel, Hisashi Nishinaga, et al. Challenges and solutions in the calibration of projection lens pupil-image metrology tools [J]. Proceedings of SPIE(S0277-786X), 2009, 7274: 72740V1-72740V10.

    [9] Takeaki Ebihara, Hideyuki Saito, Takafumi Miyaharu, et al. Characterization of Imaging Performance: Considering Both Illumination Intensity Profile and Lens Aberration [J]. Proceedings of SPIE(S0277-786X), 2005, 5754: 1693-1703.

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    CHEN An, LIN Wumei, JIANG Haibo. Impact of Non-ideal Illumination Pupil on Imaging Performance of Lithography[J]. Opto-Electronic Engineering, 2013, 40(2): 87
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