The Effect of Plasma Spatially Resolved During Diamond Film Deposited with HFCVD

YI Cheng; WANG Chuan-xin; FAN Yong-zhi; DAI Kai; MA Zhi-bin; WANG Sheng-gao; MAN Wei-dong; WU Chao

doi:10.3964/j.issn.1000-0593(2016)08-2601-06

Journals >Spectroscopy and Spectral Analysis >Volume 36 >Issue 8 >Page 2601 > Article

Spectroscopy and Spectral Analysis
Vol. 36, Issue 8, 2601 (2016)

The Effect of Plasma Spatially Resolved During Diamond Film Deposited with HFCVD

YI Cheng, WANG Chuan-xin, FAN Yong-zhi, DAI Kai, MA Zhi-bin, WANG Sheng-gao, MAN Wei-dong, and WU Chao

Author Affiliations

[in Chinese]

show less

DOI: 10.3964/j.issn.1000-0593(2016)08-2601-06 Cite this Article

YI Cheng, WANG Chuan-xin, FAN Yong-zhi, DAI Kai, MA Zhi-bin, WANG Sheng-gao, MAN Wei-dong, WU Chao. The Effect of Plasma Spatially Resolved During Diamond Film Deposited with HFCVD[J]. Spectroscopy and Spectral Analysis, 2016, 36(8): 2601 Copy Citation Text

show less

References

[3] Chen G C, Li B, Li H, et al. Diamond and Related Materials, 2010, 9(2): 15.

[7] Wang Xinchang, Zhao Tianqi, Sun Fanghong, et al. Diamond and Related Materials, 2014, 11(9): 339.

[8] Linnik S A, Gaydaychuk A V. Vacuum, 2014, 12(1): 28.