A Method of Calculating Interfacial Roughness of Multilayers for Soft X-Ray

[in Chinese]; [in Chinese]; [in Chinese]; [in Chinese]; [in Chinese]; [in Chinese]

[1] Akhsakhalyan A D, Fraerman A A, Polushkin N L et al.. Determination of layered synthetic microstructure parameters. Thin Solid Films, 1991, 203(2):317～327

[2] Abples B, Tiedje T, Liang K S et al.. Growth and structure of layered amorphous semiconductors. J. Non-Crystalline Solids, 1984, 66(1～2):351～356

[3] Spiller E, Alan E R. Determination of thickness errors and boundary roughness from the measured performance of a multilayer coating. Opt. Engng., 1986, 25(8):954～963

[4] Duparre A, Kassam S. Determination of thin film roughness and volume structure parameters from light scattering investigation. Proc. SPIE, 1991, 1530:283～286

[5] Long P, Sterns A K. High resolution electron microscopy study of X-ray multilayer structure. J. Appl. Phys., 1987, 61(4):1422

[6] Siaughter J M, Schulze D W, Hills C R et al.. Structure and performance of Mo/Si multilayer mirrors for the extreme ultraviolet. J. Appl. Phys., 1994, 76(4):2144～2154

[7] Vernon S P, Stearns D G, Rosen R S. Ion-assisted sputter deposition of molybdenum-silicon multilayers. Appl. Opt., 1993, 32(34):6969～6974

[10] Enderwood J H, Barbe T W. In low energy X-ray Diagnostics-1981, ed. Atwood D T, Henke B L. AIP Conf. Proc. No.75 (America Institute of Physics, New York, 1981). 170