• Acta Optica Sinica
  • Vol. 20, Issue 4, 543 (2000)
[in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese], and [in Chinese]
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  • [in Chinese]
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    [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese]. Phase Shifting Mask for 0.35 μm Contact Holes[J]. Acta Optica Sinica, 2000, 20(4): 543 Copy Citation Text show less
    References

    [1] Rai-Choudhury P. Handbook of Lithography. Bellingham: SPIE Optical Engineering Press, 1997.

    [2] Levenson M D, Viswanathan N S, Simpson R A. Improving resolution in photolithography with a phase shifting mask. IEEE Transaction on Electron Devices, 1982, ED-29(12):1828~1836

    [3] Hopkins. On the diffraction theory of optical images. Proc. Roy. Soc., 1953, A217(2):408~420

    [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese]. Phase Shifting Mask for 0.35 μm Contact Holes[J]. Acta Optica Sinica, 2000, 20(4): 543
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