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    Journals >Acta Photonica Sinica >Volume 32 >Issue 6 >Page 653 > Article
    • Acta Photonica Sinica
    • Vol. 32, Issue 6, 653 (2003)
    Fabrication of Submicron Elements by Ion Beam Etching
    [in Chinese]1, [in Chinese]2, [in Chinese]3, [in Chinese]2, [in Chinese]1, [in Chinese]1, [in Chinese]1, and [in Chinese]1
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    [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese]. Fabrication of Submicron Elements by Ion Beam Etching[J]. Acta Photonica Sinica, 2003, 32(6): 653 Copy Citation Text show less

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    [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese]. Fabrication of Submicron Elements by Ion Beam Etching[J]. Acta Photonica Sinica, 2003, 32(6): 653
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