• Acta Optica Sinica
  • Vol. 28, Issue 12, 2354 (2008)
Huang Biwu*, Chen Weifan, and Chen Weiqing
Author Affiliations
  • [in Chinese]
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    Huang Biwu, Chen Weifan, Chen Weiqing. Study on the Properties of SL7510 Type Photosensitive Resin for Laser Curing Rapid Prototyping[J]. Acta Optica Sinica, 2008, 28(12): 2354 Copy Citation Text show less

    Abstract

    The properties of Huntsman SL7510 type photosensitive resin were investigated by using a FT-IR spectrometer, a stereolithography apparatus, a spinning viscometer, a universal testing machine and a thermomechanical analysis meter. The experimental results showed that the photosensitive resin belongs to an epoxy-acrylic hybrid photosensitive resin, its viscosity at 30 ℃ is 335 mPa·s, its critical exposure (Ec) is 10.9 mJ/cm2, its penetration depth (Dp) is 0.14 mm, its cured volumetric shrinkage is 4.03%, the tensile strength of its cured product is 40.8 MPa, the tensile modulus of its cured product is 2009.2 MPa, the elongation at break of its cured product is 13.6%, and the glass transition temperature of its cured product is 62 ℃. According to the determined Ec and Dp values of the photosensitive resin, the processing parameters of the stereolithography apparatus were chosen to fabricate the part of a telephone shell, and the quality of the fabricated part was good.
    Huang Biwu, Chen Weifan, Chen Weiqing. Study on the Properties of SL7510 Type Photosensitive Resin for Laser Curing Rapid Prototyping[J]. Acta Optica Sinica, 2008, 28(12): 2354
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