The Stability and Measuring Technology of the Maximum Optical Path Difference of Photo-Elastic Modulator Interferograms

ZHANG Min-juan; WANG Zhi-bin; LI Xiao; LI Jin-hua; WANG Yan-chao

doi:10.3964/j.issn.1000-0593(2015)05-1436-04

Journals >Spectroscopy and Spectral Analysis >Volume 35 >Issue 5 >Page 1436 > Article

Spectroscopy and Spectral Analysis
Vol. 35, Issue 5, 1436 (2015)

The Stability and Measuring Technology of the Maximum Optical Path Difference of Photo-Elastic Modulator Interferograms

ZHANG Min-juan^1、*, WANG Zhi-bin^1、2、3, LI Xiao³, LI Jin-hua³, and WANG Yan-chao³

Author Affiliations

¹[in Chinese]

²[in Chinese]

³[in Chinese]

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DOI: 10.3964/j.issn.1000-0593(2015)05-1436-04 Cite this Article

ZHANG Min-juan, WANG Zhi-bin, LI Xiao, LI Jin-hua, WANG Yan-chao. The Stability and Measuring Technology of the Maximum Optical Path Difference of Photo-Elastic Modulator Interferograms[J]. Spectroscopy and Spectral Analysis, 2015, 35(5): 1436 Copy Citation Text

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References

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