• Acta Optica Sinica
  • Vol. 29, Issue 11, 3232 (2009)
Qi Hongxia1、2、* and Chen Chuanxiang2
Author Affiliations
  • 1[in Chinese]
  • 2[in Chinese]
  • show less
    DOI: 10.3788/aos20092911.3232 Cite this Article Set citation alerts
    Qi Hongxia, Chen Chuanxiang. Photoelectric Effects of ZnO/P-Si Heterojunction[J]. Acta Optica Sinica, 2009, 29(11): 3232 Copy Citation Text show less

    Abstract

    ZnO/P-Si heterojunctions are fabricated by pulsed laser deposition of ZnO films on P-Si substrates.The substrate temperatures of 400 ℃,500 ℃,550 ℃ and 600 ℃ are taken for the ZnO film deposition.All the heterojunctions show typical rectifying behaviors and the reverse dark current increases with the substrate temperature.The sample prepared at 550 ℃ shows the best photoelectric effects.There are different I-V characteristics as the ZnO/P-Si heterojunction is exposed to visible and ultraviolet (UV) photons.The photocurrent increases rapidly in the initial several voltages,but slowly beyond a certain reverse bias voltage.When the sample is illuminated by UV photon,the photocurrents show a gradual increase with the bias.According to the transmittance spectra of the ZnO films,it is thought that the electron-hole pairs are induced in the different depletion of the heterojunction for the visible and UV photons.
    Qi Hongxia, Chen Chuanxiang. Photoelectric Effects of ZnO/P-Si Heterojunction[J]. Acta Optica Sinica, 2009, 29(11): 3232
    Download Citation