Ablation Characteristics of C60Face by 308 nm Excimer Laser

[in Chinese]; [in Chinese]; [in Chinese]; [in Chinese]; [in Chinese]; [in Chinese]; [in Chinese]

Journals >Acta Optica Sinica >Volume 15 >Issue 7 >Page 909 > Article

Acta Optica Sinica
Vol. 15, Issue 7, 909 (1995)

Ablation Characteristics of C₆₀Face by 308 nm Excimer Laser

[in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese], and [in Chinese]

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[in Chinese]

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[in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese]. Ablation Characteristics of C₆₀Face by 308 nm Excimer Laser[J]. Acta Optica Sinica, 1995, 15(7): 909 Copy Citation Text

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Abstract

The ablation rate and etch threshold of the C60 film are measured by using 308urn excimer laser.The effect of O2gas on the ablation characteristics are discussed.

Keywords

C60 film laser ablation excimer laser

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