• Chinese Journal of Lasers
  • Vol. 49, Issue 14, 1402202 (2022)
Jie Yin1、2、3, Liang Hao1、2、*, Liangliang Yang3, Yan Li1、2, Zheng Li1、2, Qinglei Sun1、2, and Bin Shi1、2
Author Affiliations
  • 1Gemological Institute, China University of Geosciences, Wuhan 430074, Hubei, China
  • 2Advanced Manufacturing Research Institute, China University of Geosciences, Wuhan 430074, Hubei, China
  • 3Wuhan National Laboratory for Optoelectronics, Huazhong University of Science and Technology, Wuhan 430074, Hubei, China
  • show less
    DOI: 10.3788/CJL202249.1402202 Cite this Article Set citation alerts
    Jie Yin, Liang Hao, Liangliang Yang, Yan Li, Zheng Li, Qinglei Sun, Bin Shi. Investigation of Interaction between Vapor Plume and Spatter During Selective Laser Melting Additive Manufacturing[J]. Chinese Journal of Lasers, 2022, 49(14): 1402202 Copy Citation Text show less
    Schematic of experimental setup for high spatial-temporal resolution in situ imaging during SLM
    Fig. 1. Schematic of experimental setup for high spatial-temporal resolution in situ imaging during SLM
    Time series snapshots of evolution of molten pool and spatter behavior as a function of laser energy density (Ev) during SLM. (a1)-(a5) No obvious droplet column ejection occurs with Ev of 27.5 J·mm-3; (b1)-(b5) a subthreshold ejection occurs where the droplet column absorbs back into the molten pool with Ev of 59.0 J·mm-3; (c1)-(c5) a droplet column oscillates and eventually breaks up into spatter particles with Ev of 90.4 J·mm-3
    Fig. 2. Time series snapshots of evolution of molten pool and spatter behavior as a function of laser energy density (Ev) during SLM. (a1)-(a5) No obvious droplet column ejection occurs with Ev of 27.5 J·mm-3; (b1)-(b5) a subthreshold ejection occurs where the droplet column absorbs back into the molten pool with Ev of 59.0 J·mm-3; (c1)-(c5) a droplet column oscillates and eventually breaks up into spatter particles with Ev of 90.4 J·mm-3
    Droplet column ejection velocity and ejection angle as a function of time during SLM (the droplet column breaks up into a large number of droplet spatters when the ejection velocity is greater than the threshold of escape velocity. The discontinuity of curve represents breaking up of droplet column, Ev=90.4 J·mm-3)
    Fig. 3. Droplet column ejection velocity and ejection angle as a function of time during SLM (the droplet column breaks up into a large number of droplet spatters when the ejection velocity is greater than the threshold of escape velocity. The discontinuity of curve represents breaking up of droplet column, Ev=90.4 J·mm-3)
    Powder spatter behavior driven by metal vapor entrainment during SLM. Powder particles P1, P2, and P3 agglomerate on the substrate; P1 and P2 eject as large spatters and enter entrained inert gas flow at 600 μs; P2 and small spatters (P4-P8) enter the metal vapor plume; P3 locates at the denudation zone adjacent to the melt track (Ev=50.9 J·mm-3)
    Fig. 4. Powder spatter behavior driven by metal vapor entrainment during SLM. Powder particles P1, P2, and P3 agglomerate on the substrate; P1 and P2 eject as large spatters and enter entrained inert gas flow at 600 μs; P2 and small spatters (P4-P8) enter the metal vapor plume; P3 locates at the denudation zone adjacent to the melt track (Ev=50.9 J·mm-3)
    Evolution of ejection angle θ and ejection velocity u of the large spatters (P1 and P2) and small spatters (P4-P8) driven by entrained inert gas flow during SLM. The ejection angle of P2 is in good agreement with average ejection angle of small spatters (P4-P8) during t=980-1100 μs, which indicates P2 enters into the metal vapor plume
    Fig. 5. Evolution of ejection angle θ and ejection velocity u of the large spatters (P1 and P2) and small spatters (P4-P8) driven by entrained inert gas flow during SLM. The ejection angle of P2 is in good agreement with average ejection angle of small spatters (P4-P8) during t=980-1100 μs, which indicates P2 enters into the metal vapor plume
    Schematic of spatter ejection process and interaction between metal vapor and spatter in SLM
    Fig. 6. Schematic of spatter ejection process and interaction between metal vapor and spatter in SLM
    Upper surface of a typical spatter is irradiated by laser, resulting in vapor recoil and deflection of spatter trajectory during SLM. t=100-300 μs is vapor lifting dominant stage, and t=350-450 μs is vapor recoil dominant stage (Ev=50.9 J·mm-3)
    Fig. 7. Upper surface of a typical spatter is irradiated by laser, resulting in vapor recoil and deflection of spatter trajectory during SLM. t=100-300 μs is vapor lifting dominant stage, and t=350-450 μs is vapor recoil dominant stage (Ev=50.9 J·mm-3)
    Vapor recoil pressure-driven spatter (P9) behavior during SLM. (a) Deflection of spatter trajectory; (b) ejection angle θ and ejection velocity u of spatter as a function of time
    Fig. 8. Vapor recoil pressure-driven spatter (P9) behavior during SLM. (a) Deflection of spatter trajectory; (b) ejection angle θ and ejection velocity u of spatter as a function of time
    ElementMass fraction /%
    Al0.56
    Ti1.01
    Cr18.94
    Mn0.01
    Fe18.23
    Mo3.00
    Nb4.98
    C0.04
    NiBal.
    Table 1. Chemical composition of GH4169 powder in experiment
    Thermophysical parameterValue
    Liquidus temperature, Tm/K1609
    Evaporation temperature, Tb/K3190
    Density of solid metal, ρs/(kg·m-3)8192
    Density of liquid metal, ρm/(kg·m-3)7400
    Thermal conductivity of liquid metal, k /(W·m-1·K-1)34.5
    Surface tension, σ /(N·m-1)1.88
    Table 2. Thermophysical parameters of GH4169[27-28]
    Jie Yin, Liang Hao, Liangliang Yang, Yan Li, Zheng Li, Qinglei Sun, Bin Shi. Investigation of Interaction between Vapor Plume and Spatter During Selective Laser Melting Additive Manufacturing[J]. Chinese Journal of Lasers, 2022, 49(14): 1402202
    Download Citation