• Opto-Electronic Engineering
  • Vol. 34, Issue 9, 46 (2007)
[in Chinese], [in Chinese], and [in Chinese]
Author Affiliations
  • [in Chinese]
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    DOI: Cite this Article
    [in Chinese], [in Chinese], [in Chinese]. Design of fold laser projection lithography lens[J]. Opto-Electronic Engineering, 2007, 34(9): 46 Copy Citation Text show less
    References

    [1] JAIN K,DUNN T J,BLACK P P.High-speed,high-resolution large-area exposure system for PCB patterning[J].Printed circuit fabrication,1997,20(5):34-36.

    [2] JAIN K,ZEMEL M,KLOSNER M.Large-area high-resolution lithography and photoablation systems for microelectronics and optoelectronics fabrication[J].Proceedings of the IEEE,2002,90(10):1681-1688.

    [3] JAIN K,KLOSNER M,ZEMEL M,et al.Flexible electronics and displays:high-resolution,roll-to-roll,projection lithography and photoablation processing technologies for high-throughput production[J].Proceeding of the IEEE,2005,93(8):1500-1510.

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    [in Chinese], [in Chinese], [in Chinese]. Design of fold laser projection lithography lens[J]. Opto-Electronic Engineering, 2007, 34(9): 46
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