• Acta Physica Sinica
  • Vol. 68, Issue 11, 113101-1 (2019)
Guang-Zhen Dai1, Yong-Zhao Jiang1、*, Tian-Ming Ni1, Xin Liu1, Lin Lu1, and Qi Liu2
Author Affiliations
  • 1College of Electrical Engineering, Anhui Polytechnic University, Wuhu 241000, China
  • 2Institute of Microelectronics of Chinese Academy of Sciences, Beijing 100029, China
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    DOI: 10.7498/aps.68.20181995 Cite this Article
    Guang-Zhen Dai, Yong-Zhao Jiang, Tian-Ming Ni, Xin Liu, Lin Lu, Qi Liu. First principles study of effect of vaiable component Al on HfO2 resistance [J]. Acta Physica Sinica, 2019, 68(11): 113101-1 Copy Citation Text show less
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    Guang-Zhen Dai, Yong-Zhao Jiang, Tian-Ming Ni, Xin Liu, Lin Lu, Qi Liu. First principles study of effect of vaiable component Al on HfO2 resistance [J]. Acta Physica Sinica, 2019, 68(11): 113101-1
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