[1] Franklin M. Schellenberg. Resolution enhancement technology the past, the present, and extensions for the future[C]. Proc. SPIE, 2004, 5377: 1~20
[2] ITRS2005[S] (EB/OL), 2005. http:∥www.itrs.net/
[5] Konstantinos Adam, Yuri Granik, Andres Torres et al.. Improved modeling performance with an adapted vectorial formulation for the Hopkins imaging equation[C]. Proc. SPIE, 2003, 5040: 78~91
[6] Mark D. Smith, Chris A. Mack. Methods for benchmarking photolithography simulators[C]. Proc. SPIE, 2003, 5040: 57~68
[7] S. R. J. Brueck, Xiaolan Chen. Spatial frequency analysis of optical lithography resolution enhancement techniques[J]. Proc. SPIE, 1999, 3679: 715~725
[8] C. A. Mack. The lithography expert: the Rayleigh depth of focus[J]. Microlithography World, 2004, (2): 14~15
[9] C. A. Mack. The lithography expert: off axis illumination[J]. Microlithography World, 2003, (8): 14~16
[10] J. F. Chen, John S. Peterson, Robert Socha et al.. Binary halftone chromeless PSM technology for λ/4 optical lithography[C]. Proc. SPIE, 2001, 4346: 515~533