• Acta Photonica Sinica
  • Vol. 49, Issue 12, 216 (2020)
Dong-mei LIU1, Bo-yang WEI1、*, Xiu-hua FU1, Jing ZHANG1, Suo-tao DONG1, and Shuang LI2
Author Affiliations
  • 1College of Photoelectric Engineering, Changchun University of Science and Technology, Changchun30022, China
  • 2Optorun (Shanghai) Co., Ltd., Shanghai00444,China
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    DOI: 10.3788/gzxb20204912.1231001 Cite this Article
    Dong-mei LIU, Bo-yang WEI, Xiu-hua FU, Jing ZHANG, Suo-tao DONG, Shuang LI. Development of Polycarbonate High Strength Ultra-low Reflectivity Film[J]. Acta Photonica Sinica, 2020, 49(12): 216 Copy Citation Text show less
    Refractive index of two materials
    Fig. 1. Refractive index of two materials
    Theoretical design curve of antireflection film
    Fig. 2. Theoretical design curve of antireflection film
    Surface roughness of substrate at different plasma treatment times
    Fig. 3. Surface roughness of substrate at different plasma treatment times
    The surface roughness of the substrate during different plasma treatment times
    Fig. 4. The surface roughness of the substrate during different plasma treatment times
    Stress fitting curve
    Fig. 5. Stress fitting curve
    Spectral test curve
    Fig. 6. Spectral test curve
    Rate change curve
    Fig. 7. Rate change curve
    Schematic diagram of PID control electron gun current
    Fig. 8. Schematic diagram of PID control electron gun current
    Deposition rate after PID adjustment
    Fig. 9. Deposition rate after PID adjustment
    PID stable film forming rate spectral test curve
    Fig. 10. PID stable film forming rate spectral test curve
    ParametersIndicators
    SubstratePolycarbonate
    Incident angle/(º)0
    Spectral range/nm430~700
    Absolute reflectivity/%<0.15
    Table 1. Technical indexes of subtracting the reverse membrane
    PerformanceNumerical
    Bibulous rate/%0.15
    Modulus of elasticity in tension/MPa2 200~2 500
    Bending strength/MPa106
    Coefficient of linear expansion/(10-5K-1)6~7
    Brinell hardness/MPa97~104
    Transmittance magnitude/%87~90
    Table 2. Polycarbonate synthesis and performance

    Annealing

    temperature/℃

    Annealing time/hIon source energyFilm stress/MPa
    Voltage/VCurrent/mAAnnealing beforeAfter annealing
    Sample11201300300-265-205
    Sample21202300300-253-213
    Sample31203300300-256-209
    Sample41204300300-258-224
    Table 3. Vacuum cooling parameters
    Deposition time/sSingle layer stress/MPa
    TiO2SiO2
    30-426-476
    60-455-477
    90-484-398
    Table 4. Monolayer stress of the two materials
    Membrane layerMaterialVoltage/VCurrent/mAAcc/VO2/sccmAr/sccm
    1~2TiO28008001509010
    SiO2800800150608
    3~8TiO25005001509010
    SiO2500500150608
    TiO25005001509010
    SiO2500500150608
    TiO25005001509010
    SiO2500500150608
    9~10TiO28008001509010
    SiO2800800150608
    Table 5. Notched ion source process parameters record table
    Membrane layerStress/MPa
    1~2-132
    1~8-84
    1~10-96
    Table 6. Layered gradient stress of anti-reflection film
    Dong-mei LIU, Bo-yang WEI, Xiu-hua FU, Jing ZHANG, Suo-tao DONG, Shuang LI. Development of Polycarbonate High Strength Ultra-low Reflectivity Film[J]. Acta Photonica Sinica, 2020, 49(12): 216
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