[1] M. Totzeck, P. Graupner, T. Heil et al.. Polarization influence on imaging [J]. J. Microlithography, Microfabrication, and Microsystems, 2005, 4(3): 31108~31131
[2] Polarizing Optical Systems [P]. US patent 2936673, 1960
[3] D. Flagello, B. Geh, S. Hansen et al.. Polarization effects associated with hyper-numerical-aperture (>1) lithography [J]. J. Microlithography, Microfabrication, and Microsystems, 2005, 4(3): 31104~31131
[4] Daniel J. Reiley, Russell A. Chipman. Coating-induced wave-front aberrations:on-axis astigmatism and chromatic aberration in all-reflecting systems [J]. Appl. Opt., 1994, 33(10): 2002~2004
[5] David G. Crandall, Russell A. Chipman. Polarization aberrations of crossed folding mirrors [C]. SPIE, 1995, 2537: 85~86
[6] Norihiro Yamamoto, Jongwook Kyeb, Harry J. Levinson. Polarization aberration analysis using Pauli-Zernike representation [C]. SPIE, 2007, 6520: 65200Y1~65200Y12
[7] R. Clark Jones. A new calculus for the treatment of optical systems, I. description and discussion of the calculus [J]. J. Opt. Soc. Am., 1941, 31(7): 488~493
[8] A. L. Sokolov. Matrix method for calculating polarization aberrations [J]. J. Opt. Technol., 2008, 75(2): 79~84
[9] A. L. Sokolov. Calculation of polarization aberrations by the method of polarization-wave matrices [J]. Opt. Spectrosc., 2007, 103(4): 640~645
[10] Michael Shribak, Shinya Inoue, Rudolf Oldenbourg. Polarization aberrations caused by differential transmission and phase shift in high numerical-aperture lenses: theory, measurement,and rectification [J]. Opt. Engng., 2002, 41(5): 943~945
[11] Jongwook Kyea, Gregory McIntyreb, Yamamoto Norihiroc et al.. Polarization aberration analysis in optical lithography systems [C]. SPIE, 2006, 6154: 61540E1~61540E11
[12] Shang Shuzhen, Shao Jianda, Liao Chunyan et al.. High-reflectance 193 nm Al2O3/MgF2 mirrors [J]. Applied Surface Science, 2005, 249(1-4): 157~161