Study of measuring instrument for an intelligent infrared imaging facula

[in Chinese]; [in Chinese]

Journals >Opto-Electronic Engineering >Volume 31 >Issue 9 >Page 37 > Article

Opto-Electronic Engineering
Vol. 31, Issue 9, 37 (2004)

Study of measuring instrument for an intelligent infrared imaging facula

[in Chinese]^1、2 and [in Chinese]²

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¹[in Chinese]

²[in Chinese]

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DOI: Cite this Article

[in Chinese], [in Chinese]. Study of measuring instrument for an intelligent infrared imaging facula[J]. Opto-Electronic Engineering, 2004, 31(9): 37 Copy Citation Text

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References

[1] WANG Qing-you.Application technology of CCD[M].Tianjing:Tianjing University Press,2000.30-40.(in Chinese).

[2] YU Dao-yin,TAN Hen-ying.Engineering optics[M].Beijing:China Machine Press,1999.256-257.(in Chinese).

[4] TAPLIN S,PODOLEANU A GH,WEBB D J,et al.Displacement sensor using channelled spectrum dispersed on a linear CCD array[J].Electronics Letters,1993,29 (10):896-897.

[5] RAMESH SATHAPPAN,BARTLETT MATTHEW,JIANG Hua-bei.CCD-based spectroscopic imaging system for biodiagnostics[J].Critical Reviews in Biomedical Engineering,1998,26(5):413.

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[1] ZHANG Xue-dian, QIAN Yan-hua, CHANG Min, JIANG Min-shan. Monitoring Method for Filter Film Thickness Based on the Combination of Photoelectric Extreme Value and Quartz Crystal Oscillation[J]. Acta Photonica Sinica, 2016, 45(6): 631001

[in Chinese], [in Chinese]. Study of measuring instrument for an intelligent infrared imaging facula[J]. Opto-Electronic Engineering, 2004, 31(9): 37

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