Design and fabrication of an etching diffraction grating based on photonic crystal reflection mirrors

Yuan Pei; Wang Yue; Wu Yuanda; An Junming; Zhang Jiashun; Zhu Lianqing

doi:10.3788/irla201948.0916005

[1] Tan Ying, Wu Hao, Dai Daoxin. Silicon-based hybrid (de)multiplexer for wavelength-/polarization-division-multiplexing[J]. Journal of Lightwave Technology, 2018, 36(11): 2051-2058.

[2] Xu Siyu, Zhang Zhaojian, He Xin, et al. Plasmonic triple-wavelength demultiplexing structure based on metal-insulator-metal waveguides side-coupled with nanoring cavities [J]. Infrared and Laser Engineering, 2018, 48(2): 0221001.

[3] Yuan Pei, Wang Yue, Wu Yuanda, et al. Design and fabrication of wavelength tunable AWGs based on the thermo-optic effect [J]. Chinese Optics Letters, 2018, 16(1): 010601.

[4] Imran A B, Doerr Chiristopher R. Interleaved silicon nitride AWG spectrometers [J]. IEEE Photonics Technology Letters, 2019, 31(1): 90-93.

[5] Li Kaili, Zhang Jiashun, An Junming, et al. Design and fabrication of 25-channel 200 GHz AWG based on Si nanowire waveguides [J]. Optoelectronics Letters, 2017, 13(1): 241-244. (in Chinese)

[6] Liu Zhiming, Chen Kunfeng, Gao Yesheng, et al. Determination problem of mode effective refractive index in the free propagation region of AWG [J]. Infrared and Laser Engineering, 2013, 42(8): 2146-2149. (in Chinese)

[7] Chen Xin, Wu Aimin, Qiu Chao, et al. Etching diffraction grating of silicon substrate and design of flatten [J]. Laser Technology, 2017, 41(3): 361-366. (in Chinese)

[8] Shi Zhimin, He Jianjun, He Sailing. A hybrid diffraction method for the design of etched diffraction grating demultiplexers [J]. Journal of Lightwave Technology, 2005, 23(3): 1426-1434.

[9] Wang Xiaoxin, Liu Jifeng. Emerging technologies in Si photonics [J]. Journal of Semiconductors, 2018, 39(6): 061001.

[10] Li Ming, Zhang Lin, Tong Limin, et al. Hybrid silicon nonlinear photonics [J]. Phtonics Research, 2018, 6(5):B13-B22.

[11] Brouckaert Joost, Bogaerts Wim, Dumon Pieter, et al. Planar concave grating demultiplexer fabricated on a nanophotonic silicon-on-insulator platform [J]. Journal of Lightwave Technology, 2007, 25(5): 1269-1275.

[12] Feng Dazeng, Qian Wei, Liang Hong, et al. Novel fabrication tolerant flat-top demultiplexers based on etched diffraction gratings in SOI [C]//2008 5th IEEE International Conference on Group IV Photonics, 2008: 386-388.