• Journal of Advanced Dielectrics
  • Vol. 14, Issue 6, 2340011 (2024)
M. E. Kutepov1,*, V. E. Kaydashev1, D. V. Stryukov2, A. S. Konstantinov3..., A. S. Mikheykin3, A. V. Nikolskiy4, A. T. Kozakov4, A. D. Morozov5, M. A. Kashchenko5, G. V. Alymov5 and E. M. Kaidashev1|Show fewer author(s)
Author Affiliations
  • 1I. I. Vorovich Mathematics,Mechanics and Computer Science Institute,Laboratory of Nanomaterials,Southern Federal University,200/1 Stachki Avenue,344090 Rostov-on-Don,Russia
  • 2Federal Research Centre,The Southern Scientific Centre of the Russian Academy of Sciences,Chekhov Avenue,41,344006,Rostov-on-Don,Russia
  • 3Physics Faculty,Southern Federal University,5 Zorge Street,344090 Rostov-on-Don,Russia
  • 4Institute of Physics,Southern Federal University,194 Stachki Avenue,344090 Rostov-on-Don,Russia
  • 5Moscow Institute of Physics and Technology (MIPT),Institutskiy 9,141701 Dolgoprudny,Russia
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    DOI: 10.1142/S2010135X23400118 Cite this Article
    M. E. Kutepov, V. E. Kaydashev, D. V. Stryukov, A. S. Konstantinov, A. S. Mikheykin, A. V. Nikolskiy, A. T. Kozakov, A. D. Morozov, M. A. Kashchenko, G. V. Alymov, E. M. Kaidashev. Optimizing deposition regimes to fabricate VO2/TiO2/c-Al2O3 thin films for active metasurfaces[J]. Journal of Advanced Dielectrics, 2024, 14(6): 2340011 Copy Citation Text show less
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    M. E. Kutepov, V. E. Kaydashev, D. V. Stryukov, A. S. Konstantinov, A. S. Mikheykin, A. V. Nikolskiy, A. T. Kozakov, A. D. Morozov, M. A. Kashchenko, G. V. Alymov, E. M. Kaidashev. Optimizing deposition regimes to fabricate VO2/TiO2/c-Al2O3 thin films for active metasurfaces[J]. Journal of Advanced Dielectrics, 2024, 14(6): 2340011
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