• Acta Optica Sinica
  • Vol. 26, Issue 5, 726 (2006)
[in Chinese]*
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  • [in Chinese]
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    [in Chinese]. Dynamic Gaussian Model of Linewidth in Defocus Writing[J]. Acta Optica Sinica, 2006, 26(5): 726 Copy Citation Text show less
    References

    [4] William Goltsos, Sharlene Liu. Polar coordinate laser writer for binary optics fabrication[C]. Proc. SPIE, 1990, 1211: 137~147

    [5] B. Niemann, T. Wilhein, T. Schliebe et al.. A special method to create gratings of variable line density by low electron beam lithography[J]. Microelectron Engng., 1996, 30: 49~52

    [7] Hajime Onda. Line width control on laser beam writing (second report) Line width control by defocusing[J]. J. Jpn. Soc. Precis Engng., 1999, 65(8): 1158~1162

    [8] Yang Guoguang, Shen Yibing. Research on laser direct writing system and its lithography properties[C]. Proc. SPIE, 1998, 3550: 409~418

    CLP Journals

    [1] Jin Zhanlei, Tan Jiubin, Zhang Shan, Wang Lei. Research of Linewidth Stabilizing Method During Defocusing Laser Direct Writing[J]. Acta Optica Sinica, 2008, 28(9): 1730

    [in Chinese]. Dynamic Gaussian Model of Linewidth in Defocus Writing[J]. Acta Optica Sinica, 2006, 26(5): 726
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