• Chinese Journal of Lasers
  • Vol. 37, Issue 2, 385 (2010)
Du Xiaoqing1,*, Chang Benkang2, Qian Yunsheng2, Fu Rongguo2..., Gao Pin2 and Qiao Jianliang2|Show fewer author(s)
Author Affiliations
  • 1[in Chinese]
  • 2[in Chinese]
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    DOI: 10.3788/cjl20103702.0385 Cite this Article Set citation alerts
    Du Xiaoqing, Chang Benkang, Qian Yunsheng, Fu Rongguo, Gao Pin, Qiao Jianliang. Activation Technique of GaN Negative Electron Affinity Photocathode[J]. Chinese Journal of Lasers, 2010, 37(2): 385 Copy Citation Text show less

    Abstract

    Metal organic chemistry vaporation deposition (MOCVD) epitaxial p-type GaN layer is used as emission material of GaN photocathode. By using on-line measurement of photocurrent in activation process,the influences of Cs activation,Cs/O alternate activation and high-low temperature two-step activation techniques on photoemission performance of GaN photocathode are investigated. The experimental results show that GaN photocathode can obtain about 20% quantum efficiency only by Cs activation,and the quantum efficiency can be increased slightly by two or three Cs/O cycles. But the high-low two-step activation technique can not increase the quantum efficiency. The experimental phenomena are explained by the dipole surface model.