Laser marking process on transparent materials

Yinan Zhang; Wen Sun; Defeng Mo; Qinfei Xu; Xue Li

doi:10.3788/IRLA20210416

Journals >Infrared and Laser Engineering >Volume 51 >Issue 5 >Page 20210416 > Article

Infrared and Laser Engineering
Vol. 51, Issue 5, 20210416 (2022)

Laser marking process on transparent materials

Yinan Zhang^1、2, Wen Sun^1、2、*, Defeng Mo^1、2, Qinfei Xu^1、2, and Xue Li^1、2

Author Affiliations

¹Shanghai Institute of Technical Physics, Chinese Academy of Sciences, Shanghai 200083, China

²Key Laboratory of Infrared Imaging Materials and Devices, Chinese Academy of Sciences, Shanghai 200083, China

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DOI: 10.3788/IRLA20210416 Cite this Article

Yinan Zhang, Wen Sun, Defeng Mo, Qinfei Xu, Xue Li. Laser marking process on transparent materials[J]. Infrared and Laser Engineering, 2022, 51(5): 20210416 Copy Citation Text

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Measured ln(Ep) versus D2 and fitting results

Fig. 1. Measured ln(E_p) versus D² and fitting results

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Fig. 2. Radial distribution of laser energy density based on fitting results

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Fig. 3. Measured output spot diameter versus defocus distance of laser processing head

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Fig. 4. Relative energy density versus defocus distance of output spot of laser processing head

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Fig. 5. Effects of laser beam scanning angle of laser processing head on the geometry deviation of marking position

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Fig. 6. Macro photo of laser marking on IR Conning glass at different focusing depths

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Fig. 7. Photo of laser marking on the upper surface at relative laser power of 9% and 8% with one scan

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Name	Parameters	Remarks
Wavelength	515 (Green)	1030 nm Yb: YAG doubling
Average laser power/W	15	1%-100% available
Pulse width/ps	<10	Picosecond pulse
Maximum single pulse energy/μJ	75	1%-100% available
Range of repeat frequency/kHz	200-400	Set 200 kHz on this equipment
Beam quality (M²)	<1.3	Gauss distribution

Table 1. Laser parameters

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Name	Parameter
Designed operation wavelength/nm	515-540
Effective focal length/mm	104.7
Working distance/mm	138.5
Maximum scan angle/(°)	13.1
Scan area/mm²	46×46
Laser spot diameter/μm	10

Table 2. Linos F-Theta-Ronar lens and galvanometer scanning parameters of laser processing

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No.	Focus position/mm	Eye observation	Microscope observation	Remarks
1	2	Clear	Clear-two marks	Upper surface
2	1.5	Clear	Clear-two marks
3	1	Clear	Clear-two marks
4	0.5	Clear	Clear-two marks
5	0.4	Clear	Clear-two marks
6	0.3	Clear	Clear-two marks, nearly on the same plane
7	0.2	Clear	Clear-one mark
8	0.1	Clear	Clear-one mark
9	0	Clear	Clear-one mark	Lower surface
10	−0.1	Clear	Faint-one mark
11	−0.2	Faint	Faint-one mark
12	−0.3	Invisible	Invisible

Table 3. Initial test result of ps laser marking on IR Corning glass

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Laser power	Focus position	Marking characteristic	Geometry deviation	Marking effect	Evaluation
Larger	Close to upper surface	Extend from upper surface to lower surface	Little	Etching too more, none geometry deviation	×
Larger	Middle	Extend from middle to both upper and lower surface	Medium	Etching even more, have geometry deviation	×
Larger	Lower surface	Extend from lower surface to upper surface	Large	Etching too more, have geometry deviation	×
Appropriate	Close to upper surface	Less extend from upper surface to lower surface	None	Etching suitable, no geometry deviation	√
Appropriate	Middle	Less extend from middle to upper and lower surface	Medium	Etching suitable, have geometry deviation	×
Appropriate	Lower surface	Less extend from lower surface to upper surface	Large	Etching suitable, have geometry deviation	×

Table 4. Result and strategy of marking on transparent sample

Yinan Zhang, Wen Sun, Defeng Mo, Qinfei Xu, Xue Li. Laser marking process on transparent materials[J]. Infrared and Laser Engineering, 2022, 51(5): 20210416

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