Researching

Journals
  • Advanced Photonics
  • Photonics Insights
  • Advanced Photonics Nexus
  • Photonics Research
  • Advanced Imaging
  • View All Journals
  • Chinese Optics Letters
  • High Power Laser Science and Engineering
    • Articles
  • Optics
  • Physics
  • Geography
  • View All Subjects
    • Conferences
  • CIOP
  • HPLSE
  • AP
  • View All Events
    • News
    About CLP
    Search by keywords or author
    Journals >Electro-Optic Technology Application >Volume 25 >Issue 3 >Page 53 > Article
    • Electro-Optic Technology Application
    • Vol. 25, Issue 3, 53 (2010)
    Research on Illumination Measuring System for Mask Projection Stereolithography
    TAN Dong-cai, XU Guang-shen, LUO Sheng, and JIN Jing
    Author Affiliations
  • [in Chinese]
    • show less
    DOI: Cite this Article
    TAN Dong-cai, XU Guang-shen, LUO Sheng, JIN Jing. Research on Illumination Measuring System for Mask Projection Stereolithography[J]. Electro-Optic Technology Application, 2010, 25(3): 53 Copy Citation Text show less
    References

    [6] Arnaud B，Paul B,Christian V．Rapid prototyping of small size objects［J］.Rapid Prototyping Journal，2002，6(4)：259-266.

    Abstract
    Get PDF(in Chinese)
    Figures&Tables (0)
    Equations (0)
    References (1)
    Get Citation
    Copy Citation Text
    TAN Dong-cai, XU Guang-shen, LUO Sheng, JIN Jing. Research on Illumination Measuring System for Mask Projection Stereolithography[J]. Electro-Optic Technology Application, 2010, 25(3): 53
    Download Citation
    Tools
    Share
    Save the article for my favorites
    Paper Information
    Recommended Topics
    laser devices and laser physics
    Lasers and Laser Optics
    Laser physics
    laser manufacturing
    Instrumentation, Measurement and Metrology