• Journal of Inorganic Materials
  • Vol. 35, Issue 6, 675 (2020)
Yajie MO1、2, Minglei WANG1、2, Weijie CHEN1, and Guoqiang LIN1、2、*
Author Affiliations
  • 1Material Science and Engineering School, Dalian University of Technology, Dalian 116024, China
  • 2Key Laboratory for Material Modification by Laser, Ion and Electron Beams, Ministry of Education, Dalian University of Technology, Dalian 116024, China
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    DOI: 10.15541/jim20190353 Cite this Article
    Yajie MO, Minglei WANG, Weijie CHEN, Guoqiang LIN. Composition, Structure and Properties of the Cr1-xAlxN Hard Films Deposited by Arc Ion Plating[J]. Journal of Inorganic Materials, 2020, 35(6): 675 Copy Citation Text show less
    Schematic diagram of enhanced magnetic filtered pulse bias arc ion plating apparatus
    1. Schematic diagram of enhanced magnetic filtered pulse bias arc ion plating apparatus
    SEM surface and cross-sectional images of Cr1-xAlxN films
    2. SEM surface and cross-sectional images of Cr1-xAlxN films
    XPS spectra of Cr1-xAlxN films obtained after argon ions sputtering for 600 s
    3. XPS spectra of Cr1-xAlxN films obtained after argon ions sputtering for 600 s
    High resolution XPS spectra of Cr1-xAlxN films
    4. High resolution XPS spectra of Cr1-xAlxN films
    XRD patterns of Cr1-xAlxN films
    5. XRD patterns of Cr1-xAlxN films
    Hardness (H), elastic modulus (E) and H/E* of Cr1-xAlxN films
    6. Hardness (H), elastic modulus (E) and H/E* of Cr1-xAlxN films
    Typical load-displacement curves of Cr1-xAlxN films
    7. Typical load-displacement curves of Cr1-xAlxN films
    Frictional force vs normal force curves for Cr1-xAlxN films during scratch test
    8. Frictional force vs normal force curves for Cr1-xAlxN films during scratch test
    Micrographs of scratch of Cr1-xAlxN films
    9. Micrographs of scratch of Cr1-xAlxN films
    SampleN2 flow/sccmWorking pressure/PaArc current/APulsed biasDeposition time/min
    ICrIAlFrequency/kHzAmplitude/VDuty cycle/%
    CrAlN 1#800.81105030-20040120
    CrAlN 2#800.8956530-20040120
    CrAlN 3#800.8808030-20040120
    CrAlN 4#800.8659530-20040120
    Table 1. Deposition parameters of Cr1-xAlxN films
    SampleSurface composition/at%$\frac{{{C}_{\text{Al}}}}{({{C}_{Cr}}+{{C}_{\text{Al}}})}$$\frac{{{C}_{\text{N}}}}{({{C}_{Cr}}+{{C}_{\text{Al}}})}$Film composition(Cr1-xAlxNy)
    CrAlNO
    CrAlN 1#32.922.641.82.70.410.75Cr0.59Al0.41N0.75
    CrAlN 2#26.229.141.33.40.530.75Cr0.47Al0.53N0.75
    CrAlN 3#19.834.642.23.40.640.78Cr0.36Al0.64N0.78
    CrAlN 4#15.139.942.12.90.730.77Cr0.27Al0.73N0.77
    Table 2. Surface composition of Cr1-xAlxN films
    SampleLC1/NLC2/NCPRS
    CrAlN 1#75.483.8633.36
    CrAlN 2#64.687.31466.42
    CrAlN 3#60.280.41216.14
    CrAlN 4#61.382.51299.56
    Table 3. Critical load and CPRS of Cr1-xAlxN films
    Yajie MO, Minglei WANG, Weijie CHEN, Guoqiang LIN. Composition, Structure and Properties of the Cr1-xAlxN Hard Films Deposited by Arc Ion Plating[J]. Journal of Inorganic Materials, 2020, 35(6): 675
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