• Chinese Optics Letters
  • Vol. 11, Issue 9, 090802 (2013)
Hongbo Shang, Wei Huang, Chunlai Liu, Weicai Xu, and Wang Yang
DOI: 10.3788/col201311.090802 Cite this Article Set citation alerts
Hongbo Shang, Wei Huang, Chunlai Liu, Weicai Xu, Wang Yang. Glass homogeneity effect on wavefront aberration in lithography projection lens[J]. Chinese Optics Letters, 2013, 11(9): 090802 Copy Citation Text show less
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CLP Journals

[1] Shanshan Mao, Yanqiu Li, Jiahua Jiang, Shihuan Shen, Ke Liu, Meng Zheng. Design of a hyper-numerical-aperture deep ultraviolet lithography objective with freeform surfaces[J]. Chinese Optics Letters, 2018, 16(3): 030801

Data from CrossRef

[1] Xinfeng Yu. Method for compensation selection of a microlithographic optical system. Applied Optics, 59, 4692(2020).

Hongbo Shang, Wei Huang, Chunlai Liu, Weicai Xu, Wang Yang. Glass homogeneity effect on wavefront aberration in lithography projection lens[J]. Chinese Optics Letters, 2013, 11(9): 090802
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