• Chinese Optics Letters
  • Vol. 11, Issue 9, 090802 (2013)
Hongbo Shang, Wei Huang, Chunlai Liu, Weicai Xu, and Wang Yang
DOI: 10.3788/col201311.090802 Cite this Article Set citation alerts
Hongbo Shang, Wei Huang, Chunlai Liu, Weicai Xu, Wang Yang. Glass homogeneity effect on wavefront aberration in lithography projection lens[J]. Chinese Optics Letters, 2013, 11(9): 090802 Copy Citation Text show less

Abstract

Analysis of glass homogeneity using the attaching interferometric data model neglects body distribution. To improve analysis accuracy, we establish the three-dimensional gradient index (GRIN) model of glass index by analyzing fused silica homogeneity distribution in two perpendicular measurement directions. Using the GRIN model, a lithography projection lens with a numerical aperture of 0.75 is analyzed. Root mean square wavefront aberration deteriorates from 0.9 to 9.65 nm and then improves to 5.9 nm after clocking.
Hongbo Shang, Wei Huang, Chunlai Liu, Weicai Xu, Wang Yang. Glass homogeneity effect on wavefront aberration in lithography projection lens[J]. Chinese Optics Letters, 2013, 11(9): 090802
Download Citation