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Journals >Acta Optica Sinica >Volume 25 >Issue 4 >Page 533 > Article

Acta Optica Sinica
Vol. 25, Issue 4, 533 (2005)

Research of Mask Division for Improving the Edge Sharpness of Photolithography

[in Chinese]^1、*, [in Chinese]¹, [in Chinese]², [in Chinese]², and [in Chinese]²

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¹[in Chinese]

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[in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese]. Research of Mask Division for Improving the Edge Sharpness of Photolithography[J]. Acta Optica Sinica, 2005, 25(4): 533 Copy Citation Text

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References

[1] Levenson M D. Wavefront engineering from 500 nm CD to 100 nm CD[C]. Proc. SPIE, 1997, 3049

CLP Journals

[1] Li Mujun, Shen Lianguan, Zhao Wei, Zheng Jinjin, Zhou Jie. Analysis of Effective Wave-Front Affecting Diffraction Field in Proximity Lithography[J]. Acta Optica Sinica, 2010, 30(2): 525

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[in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese]. Research of Mask Division for Improving the Edge Sharpness of Photolithography[J]. Acta Optica Sinica, 2005, 25(4): 533

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