• Acta Optica Sinica
  • Vol. 27, Issue 1, 187 (2007)
[in Chinese]*, [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese], and [in Chinese]
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  • [in Chinese]
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    [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese]. Fabrication of Normal Incident Cr/C High-Reflecting Mirror for 4.48 nm Soft X-Ray Laser[J]. Acta Optica Sinica, 2007, 27(1): 187 Copy Citation Text show less

    Abstract

    Near normal incident high-reflecting multilayered mirrors at 4.48 nm wavelength are designed and fabricated for Ni-like Ta soft X-ray laser and its applied experiments. Materials Cr and C are chosen to make up the high-reflecting mirror. The periodic thickness, thickness ratio of two materials and periodic number are calculated and optimized. The influence of the imperfect interface on the reflectivity of the multilayer is simulated. The Cr/C multilayer of 200 periods is deposited on the super smooth silicon substrate by the direct current magnetron sputtering technique. The periodic thickness and structure of the multilayer are measured by X-ray diffractometer (XRD). The reflectivity of the multilayer is measured at Bessy Ⅱ synchrotron radiation (SR), and the peak reflectivity is measured to be 7.5%. The grazing incident reflection index curve measured by XRD and reflection index curve by SR are fitted. The fitted thickness ratio and interface roughness of the two curves are close to each other. The measurements show the Cr/C multilayer has a good structure and a reflective peak on the demanded wavelength, which meet the design requirement.
    [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese]. Fabrication of Normal Incident Cr/C High-Reflecting Mirror for 4.48 nm Soft X-Ray Laser[J]. Acta Optica Sinica, 2007, 27(1): 187
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