[1] Yao Hanmin, Hu Song, Xing Tingwen. Optical Projection Lithography for Micro and Nano-Fabrication［M］. Beijing: Beijing University of Technology Press, 2006. 1～5

[2] Li Jinlong, Zhao Lixin, Hu Song et al.. Focusing and leveling in dual stage lithographic system［C］. SPIE, 2010, 7657: 1024～1032

[3] Y. Shibazaki, H. Kohno, M. Hamatani. An innovative platform for high-throughput, high-accuracy lithography using a single wafer stage［C］. SPIE, 2010, 7274: 424～431

[4] B. Sluijk, T. Castenmiller, R. C. de Jongh et al.. Performance results of a new generation of 300 mm lithography systems［C］. SPIE, 2001, 4346: 544～557

[5] R. Rubingh, Y. V. Dommelen, S. Tempelaars et al.. Performance of a high productivity 300 mm dual stage 193 nm 0.75 NA TWINSCANTMAT: 1100 system for 100 nm applications［C］. SPIE, 2003, 4691: 8～18

[6] M. Boonman, C. van de Vin, S. Tempelaars et al.. The performance advantages of a dual stage system［C］. SPIE, 2004, 5377: 742～757

[7] Li Xiaoping, Chen Feibiao, Li Zhidan et al.. A Kind of Focusing and Leveling Measurement Device ［P］. Chinese Patent, CN200510025462. X, 2005-10-5

[8] Yan Wei, Li Yanli, Chen Mingyong. Moiré fringe-based focusing-test scheme for optical projection lithography ［J］. Acta Optica Sinica, 2011, 31(8): 0805001

[9] Li Xiaoping, Chen Feibiao. Measurement model of focusing and leveling measurement system for projection lithography tool［J］. Acta Optica Sinica, 2007, 27(11): 1987～1991

[10] Zeng Aijun, Wang Xiangzhao, Xu Deyan. Progress in focus and level sensor for projection lithography system［J］. Laser & Optoelectronics Progress, 2004, 41(7): 24～30