• Laser & Optoelectronics Progress
  • Vol. 53, Issue 3, 31202 (2016)
Liu Wende*, Chen Chi, Fan Qiming, Chu Chu, and Luo Zhiyong
Author Affiliations
  • [in Chinese]
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    DOI: 10.3788/lop53.031202 Cite this Article Set citation alerts
    Liu Wende, Chen Chi, Fan Qiming, Chu Chu, Luo Zhiyong. Study of Instrument for Measuring Oxide Layer on Surface of Silicon Sphere Used for Avogadro Project[J]. Laser & Optoelectronics Progress, 2016, 53(3): 31202 Copy Citation Text show less
    References

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    [2] I Busch, Y Azuma, H Bettin, et al.. Surface layer determination for the Si spheres of the Avogadro project[J]. Metrologia, 2011, 48(2): S62-S82.

    [3] Nicolaus R A, G Bartl, H Bettin, et al.. Current State of Avogadro 28Si sphere S8[J]. Instrumentation and Measurement, IEEE Transactions on, 2013, 62(6): 1499-1505.

    [4] Kang Yanhui, Zhu Jigui, Luo Zhiyong, et al.. Impact analysis of Gaussian beam on measurement of single crystal silicon sphere diameter[J]. Acta Optica Sinica, 2008, 28(11): 2148-2152.

    [5] Zhang Jitao, Li Yan, Wu Xuejian, et al.. Determinating mean thickness of the oxide layer by mapping the surface of a silicon sphere[J]. Opt Express, 2010, 18(7): 7331-7339.

    [6] Liu Wende, Chen Chi, Luo Zhiyong, et al.. Progress and study of measurement of surface oxide layer on single crystal silicon sphere[J]. Laser & Optoelectronics Progress, 2014, 51(3): 030007.

    [7] Yang Kun, Wang Xiangzhao, Bu Yang. Research progress of ellipsometer[J]. Laser & Optoelectronics Progress, 2007, 44(3): 43-49.

    Liu Wende, Chen Chi, Fan Qiming, Chu Chu, Luo Zhiyong. Study of Instrument for Measuring Oxide Layer on Surface of Silicon Sphere Used for Avogadro Project[J]. Laser & Optoelectronics Progress, 2016, 53(3): 31202
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