Effect of different nitrogen ion implantation parameters on surface charge accumulation and dissipation characteristics of polytetrafluoroethene

Youhui He; Hongbin Chen; Fei Li; Falun Song

doi:10.11884/HPLPB202234.220213

Journals >High Power Laser and Particle Beams >Volume 34 >Issue 12 >Page 125001 > Article

High Power Laser and Particle Beams
Vol. 34, Issue 12, 125001 (2022)

Effect of different nitrogen ion implantation parameters on surface charge accumulation and dissipation characteristics of polytetrafluoroethene

Youhui He^1、2, Hongbin Chen², Fei Li², and Falun Song^2、*

Author Affiliations

¹Graduate School of China Academy of Engineering Physics, Mianyang 621900, China

²Institute of Applied Electronics, CAEP, Mianyang 621900, China

show less

DOI: 10.11884/HPLPB202234.220213 Cite this Article

Youhui He, Hongbin Chen, Fei Li, Falun Song. Effect of different nitrogen ion implantation parameters on surface charge accumulation and dissipation characteristics of polytetrafluoroethene[J]. High Power Laser and Particle Beams, 2022, 34(12): 125001 Copy Citation Text

show less

Fig. 1. Full spectrum of XPS on PTFE surface under different treatment conditions

Download full size | View in the Article

Fig. 1. [in Chinese]

Download full size | View in the Article

Fig. 2. XPS C spectra of PTFE surface under different pulse voltage and nitrogen flow

Download full size | View in the Article

Fig. 3. XPS C spectra of PTFE surface treated with different RF source power and pulse voltage widths

Download full size | View in the Article

Fig. 4. XPS N spectra of PTFE surface under different treatment conditions

Download full size | View in the Article

Fig. 5. Surface morphology of PTFE under different nitrogen flow treatments

Download full size | View in the Article

Fig. 6. Effect of different treatment conditions on the surface resistivity of PTFE samples

Download full size | View in the Article

Fig. 7. Attenuation characteristics of central potential on PTFE surface under different treatment conditions

Download full size | View in the Article

Fig. 8. Distribution characteristics of traps on PTFE surface under different treatment conditions

Download full size | View in the Article

No.	voltage/kV	pulse width/μs	power/W	processed time/h	nitrogen flow/(cm³·min⁻¹)
1～5	3	50	200	1	10～40
6～10	5	50	200	1	10～40
11～15	7	50	200	1	10～40
16～17	3	25,75	200	1	20
18～9	5	25,75	200	1	20
20	7	25	200	1	20
21～25	5	50	100	1	10～30
26～29	5	50	400	1	10～40

Table 1. Treatment conditions of experimental samples

sample number	processing parameters	proportion of C element/%
sample number	processing parameters	CF3	CF2	CF	C=O	C−O	CF₃
1	3 kV-50 μs, 10 cm³/min, 200 W, 1 h	0.00	44.02	1.29	8.62	7.44	37.45
2	3 kV-50 μs, 20 cm³/min, 200 W, 1 h	1.36	25.90	1.05	11.65	14.17	42.38
3	3 kV-50 μs, 40 cm³/min, 200 W, 1 h	5.31	61.34	1.50	2.51	3.48	23.41
4	5 kV-50 μs, 10 cm³/min, 200 W, 1 h	0.85	26.14	0.40	8.09	9.00	53.73
5	5 kV-50 μs, 20 cm³/min, 200 W, 1 h	0.33	43.08	0.44	9.72	8.27	37.78
6	5 kV-50 μs, 40 cm³/min, 200 W, 1 h	1.32	23.05	0.13	8.81	9.06	62.07
7	7 kV-50 μs, 40 cm³/min, 200 W, 1 h	2.19	67.94	3.44	2.79	7.46	21.13
8	7 kV-50 μs, 20 cm³/min, 200 W, 1 h	1.61	63.03	2.68	4.75	5.01	21.69
9	7 kV-50 μs, 10 cm³/min³, 100 W, 1 h	2.17	57.36	5.34	7.60	6.55	25.69
10	3 kV-25 μs, 20 cm³/min, 100 W, 1 h	1.03	41.13	1.80	11.19	8.81	37.74
11	3 kV-50 μs, 20 cm³/min, 100 W, 1 h	2.10	59.95	1.94	9.26	8.62	16.33
12	5 kV-50 μs, 10 cm³/min, 100 W, 1 h	1.08	19.59	2.01	5.76	10.72	64.25
13	5 kV-50 μs, 20 cm³/min³, 100 W, 1 h	0	20.68	0.14	9.87	5.86	61.92
14	5 kV-50 μs, 40 cm³/min³, 100 W, 1 h	0.00	10.84	1.18	4.78	10.12	72.34
15	5 kV-50 μs, 10 cm³/min³, 400 W, 1 h	3.34	66.43	3.01	5.65	4.98	9.53
16	5 kV-50 μs, 20 cm³/min³, 400 W, 1 h	3.69	50.59	3.67	10.84	10.70	17.97
17	5 kV-50 μs, 40 cm³/min, 400 W, 1 h	4.97	61.31	2.32	7.93	3.93	19.92

Table 2. Radicals and proportion of C elements in PTFE sample surface before and after ion implantation

Download Citation

Save the article for my favorites

Paper Information