• Opto-Electronic Engineering
  • Vol. 32, Issue 10, 93 (2005)
[in Chinese], [in Chinese], and [in Chinese]
Author Affiliations
  • [in Chinese]
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    DOI: Cite this Article
    [in Chinese], [in Chinese], [in Chinese]. Model for the calculation of slant grating alignment signals of room-temperature imprint lithography[J]. Opto-Electronic Engineering, 2005, 32(10): 93 Copy Citation Text show less
    References

    [1] H. SCHIFT,R. W. JASZEWSKI,C. DAVID,et al. Nanostructuring of polymers and fabrication of interdigitated electrodes by hot embossing lithography[J]. Microelectronic Engineering,1999,46(1-4):121-124.

    [2] L. J. HEYDEMAN,H. SCHIFT,C. DAVID,et al. Flow behaviour of thin polymer films used for hot embossing lithography[J]. Microelectronic Engineering,2000,54(3-4):229-245.

    [3] L. J. HEYDEMAN,H. SCHIFT,C. DAVID,et al. Nanofabrication using hot embossing lithography and electroforming[A]. Microelectronic Engineering [C]. Jena:Elsevier Science B V,2001. 375-380.

    [4] M. OTTO,M. BENDER,B. HADAM,et al. Characterization and application of a UV-based imprint technique [A]. Microelectronic Engineering [C]. Jena:Elsevier Science B V,2001. 361-366.

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    [in Chinese], [in Chinese], [in Chinese]. Model for the calculation of slant grating alignment signals of room-temperature imprint lithography[J]. Opto-Electronic Engineering, 2005, 32(10): 93
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