[1] Liu Fei, Li Yanqiu. Initial structure design of coaxial six-ten mirror central-obscured extreme ultraviolet lithographic objective[J]. Applied Optics, 2014, 53(28): 6444-6451.
[2] Hans Meiling, Henk Meijer, Vadim Banine, et al. First performance results of the ASML alpha demo tool [C]//SPIE, 2006, 6151: 615108.
[3] Jin Chunshui. Investigation on extreme ultraviolet lithography [D]. Changchun: Changchun Institute of Optics, Fine Mechanics and Physics, Chinese Academy of Sciences, 2002. (in Chinese)
[4] Ni Mingyang, Gong Yan. Design and analysis of kinematic lens positioning structure in lithographic projection objective[J]. Chinese Optics, 2012, 5(5): 476-484. (in Chinese)
[5] Liu Fei, Li Yanqiu. Design of high numerical aperture projection objective for industrial extreme ultraviolet lithography[J]. Acta Optica Sinica, 2011, 31(2): 0222003. (in Chinese)
[6] Cao Zhen, Li Yanqiu, Liu Fei. Manufacturable design of 16-22 nm extreme ultraviolet lithographic objective[J]. Acta Optica Sinica, 2013, 33(9): 0922005. (in Chinese)
[7] Liu Yan, Li Yanqiu, Cao Zhen. Design method of off-axis extreme ultraviolet lithographic objective system with a direct tilt process[J]. Optical Engineering, 2015, 54(7): 075102.
[8] Liu Yan, Li Yanqiu, Cao Zhen. Design of anamorphic magnification high-numerical aperture objective for extreme ultraviolet lithography by curvatures combination method[J]. Applied Optics, 2016, 55(18): 4917-4923.
[9] Liu Jun, Huang Wei. Optical system design of reflective head mounted display using freeform surfaces[J]. Infrared and Laser Engineering, 2016, 45(10): 1018001. (in Chinese)
[10] Wang Hong, Wang Lijun, Ye Feifei, et al. Design of LED headlight low-beam freeform lens based on projector system[J]. Infrared and Laser Engineering, 2012, 41(9): 2463-2467. (in Chinese)
[11] Xu Mingfei, Pang Wubin, Xu Xiangru, et al. Optical design of high-numerical aperture lithographic lenses[J]. Optics and Precision Engineering, 2016, 24(4): 740-746. (in Chinese)
[12] Wang Yongtian, Cheng Dewen, Xu Chen. The optical display technology of virtual reality[J]. Science China, 2016, 46(12): 1694-1710. (in Chinese)
[13] Cheng Dewen, Wang Yongtian, Xu Chen, et al. Design of an ultra-thin near-eye display with geometrical waveguide and freeform optics[J]. Optics Express, 2014, 22(17): 20705.
[14] Jose M Sasian, Michael R Descour. Power distribution and symmetry in lens systems[J]. Optical Engineering, 1998, 37(3): 1001-1004.
[15] Cheng Xuemin, Wang Yongtian, Hao Qun, et al. Automatic element addition and deletion in lens optimization[J]. Applied Optics, 2003, 42(7): 1309-1317.
[16] Liu Fei, Li Yanqiu. Design of multi-mirror optics for industrial extreme ultraviolet lithography[J]. Optical Review, 2013, 20(2): 120-126.
[17] Fabian Duerr, Youri Meuret, Hugo Thienpont. Potential benefits of free-form optics in on-axis imaging applications with high aspect ratio[J]. Optics Express, 2013, 21(25): 31072-31081.
[18] Cheng Dewen, Wang Yongtian, Hua Hong, et al. Design of an optical see-through head-mounted display with a low f-number and large field of view using a freeform prism[J]. Applied Optics, 2009, 48(14): 2655-2668.
[19] Li Rongbin, Zhang Zhihui, Du Xue, et al. Ultra-precision machining technology of freeform optics and its applications[J]. Infrared and Laser Engineering, 2010, 39(1): 110-115. (in Chinese)
[20] Shen Hua. Research on key techniques of tilted-wave-interferometer used in the measurement of freeform surfaces [D]. Nanjing: Nanjing University of Science & Technology, 2014. (in Chinese)
[21] Xu Xiangru. Research on imaging quality compensation and polarization aberration of hyper numerical aperture lithographic lens [D]. Changchun: Changchun Institute of Optics, Fine Mechanics and Physics, Chinese Academy of Sciences, 2017. (in Chinese)
