[1] Carman R J, Brown D J W, Piper J A. A self-consistent model for the discharge kinetics in a high-repetition-rate copper vapor laser. IEEE J. Quan. Electron., 1994, 30(8):1876～1895
[2] Cheng C, Sun W. Study on the kinetic mechanisms of copper vapor lasers with hydrogen-neon admixtures. Opt. Commun., 1997,144(1～3):109～117
[3] Carman R J, Withford M J, Brown D J W et al.. Influence of the pre-pulse plasma electron density on the performance of elemental copper vapour lasers. Opt. Commun., 1998, 157(1～6):99～104
[5] Cheng C, He S. Optimization of LC circuit parameters for obtaining maximum output of a copper vapor laser by a genetic algorithm. Microwave and Opt. Tech. Lett., 1999, 22(5):343～348
[6] Withford M J, Brown D J W, Piper J A. Optimization of H2-Ne buffer gas mixtures for copper vapor lasers. IEEE J. Quant. Electron., 1996, 32(8):1310～1315
[7] Haupt R L. An introduction to genetic algorithms for electromagnetics. IEEE Antennas and Propagat. Magazine, 1995, 37(2):7～15
[8] Weile D S, Michielssen E. Genetic algorithms optimization applied to electromagnetics: a review. IEEE Trans. Antennas Propagat., 1997, 45(3):343～353
[9] Weast R C, Astle M J. CRC Handbook of chemistry and physics, Florida: CRC Press. 1982. D94～96
[10] Huba J D. NRL Plasma Formulary. Washington: Naval Research Laboratory. 1998. 55
[16] Mildren RP,Withford MJ,Brown DJ et al.Afterglow ground-state copper density behavior in jinetically enhanced copper vapor lasers.IEEE J.Quant.Electron,1998,34(12:2275-2278
