• Infrared and Laser Engineering
  • Vol. 32, Issue 4, 343 (2003)
[in Chinese]*, [in Chinese], [in Chinese], and [in Chinese]
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  • [in Chinese]
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    [in Chinese], [in Chinese], [in Chinese], [in Chinese]. Power of small-scale CW discharge DF/HF chemical laser[J]. Infrared and Laser Engineering, 2003, 32(4): 343 Copy Citation Text show less

    Abstract

    The mixture of SF6 O2 and He which are regulated is injected into a discharge tube with 8 high-voltage electrodes. The divided F is injected into throat along flow direction. H2/D2 is injected along a long normal to the flow at the top and the bottom of the channel. The optical axis is located at 1 mm downstream of H2/D2 injectors. A small-scale continuous-wave DF/HF chemical laser is investigated. Experimental measurements indicate that its multiline output power is related to the flux of SF6, He and H2/D2. The effect on output power and laser device of O2 addition is investigated. The maximum net outputs of HF and DF are 12 W and 11 W respertively. The power is stable and regulated continuously, and the maximum operation time is 20 min.
    [in Chinese], [in Chinese], [in Chinese], [in Chinese]. Power of small-scale CW discharge DF/HF chemical laser[J]. Infrared and Laser Engineering, 2003, 32(4): 343
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